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1. (WO2014199967) PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, AND TOUCH PANEL DISPLAY DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/199967 International Application No.: PCT/JP2014/065297
Publication Date: 18.12.2014 International Filing Date: 10.06.2014
IPC:
G03F 7/004 (2006.01) ,G02F 1/1333 (2006.01) ,G03F 7/039 (2006.01) ,G06F 3/041 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/22 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
039
Macromolecular compounds which are photodegradable, e.g. positive electron resists
G PHYSICS
06
COMPUTING; CALCULATING; COUNTING
F
ELECTRIC DIGITAL DATA PROCESSING
3
Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
01
Input arrangements or combined input and output arrangements for interaction between user and computer
03
Arrangements for converting the position or the displacement of a member into a coded form
041
Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50
specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
B
ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33
Electroluminescent light sources
12
Light sources with substantially two-dimensional radiating surfaces
22
characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
Applicants:
富士フイルム株式会社 FUJIFILM CORPORATION [JP/JP]; 東京都港区西麻布2丁目26番30号 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620, JP
Inventors:
鈴木 成一 SUZUKI Shigekazu; JP
山下 史絵 YAMASHITA Shie; JP
柏木 大助 KASHIWAGI Daisuke; JP
Agent:
野口 恭弘 NOGUCHI Yasuhiro; JP
Priority Data:
2013-12512514.06.2013JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING RESIN PATTERN, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, ORGANIC EL DISPLAY DEVICE, AND TOUCH PANEL DISPLAY DEVICE
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE, PRODUIT DURCI, PROCÉDÉ DE FABRICATION DE CE PRODUIT DURCI, PROCÉDÉ DE FABRICATION D’UN MOTIF EN RÉSINE, FILM DURCI, DISPOSITIF D’AFFICHAGE À CRISTAUX LIQUIDES, DISPOSITIF D’AFFICHAGE À ÉLECTROLUMINESCENCE ORGANIQUE ET DISPOSITIF D’AFFICHAGE À ÉCRAN TACTILE
(JA) 感光性樹脂組成物、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機EL表示装置、並びに、タッチパネル表示装置
Abstract:
(EN) The purpose of the present invention is to provide: a photosensitive resin composition which provides a cured product that has high refractive index, low relative dielectric constant and excellent transparency; a cured product which is obtained using this photosensitive resin composition; a method for producing this cured product; a method for producing a resin pattern; and a liquid crystal display device, an organic EL display device and a touch panel display device, each of which comprises the above-mentioned cured product. A photosensitive resin composition according to the present invention is characterized by containing: metal oxide particles (component A); a compound represented by formula (I) (component B); a solvent (component C); a polymer that has a constituent unit having a group wherein an acid group is protected by an acid-decomposable group (component D); and a photoacid generator (component E). In formula (I), each of Ar1 and Ar2 independently represents an arylene group; R1 and/or R2 represents a monovalent organic group having a crosslinkable group; each of R3 and R4 independently represents a monovalent substituent; and each of p and q independently represents an integer of 0-4.
(FR) L’invention a pour objet : une composition de résine photosensible permettant d’obtenir un produit durci offrant un fort indice de réfraction, une faible constante diélectrique relative et une excellente transparence ; un produit durci obtenu à l’aide de cette composition de résine photosensible ; un procédé de fabrication de ce produit durci ; un procédé de fabrication d’un motif en résine ; et un dispositif d’affichage à cristaux liquides, un dispositif d’affichage à électroluminescence organique et un dispositif d’affichage à écran tactile comprenant tous le produit durci susmentionné. Une composition de résine photosensible selon la présente invention est caractérisée en ce qu’elle contient : des particules d’oxyde métallique (composant A) ; un composé représenté par la formule (I) (composant B) ; un solvant (composant C) ; un polymère possédant une unité constitutive contenant un groupe où un groupe acide est protégé par un groupe décomposable à l’acide (composant D) ; et un générateur photoacide (composant E). Dans la formule (I), Ar1 et Ar2 représentent chacun indépendamment un groupe arylène ; R1 et/ou R2 représente un groupe organique monovalent contenant un groupe réticulable ; R3 et R4 représentent chacun indépendamment un substituant monovalent ; et p et q représentent chacun indépendamment un entier compris entre 0 et 4.
(JA)  得られる硬化物が高屈折率であり、比誘電率が低く、透明性に優れた感光性樹脂組成物、上記感光性樹脂組成物を用いた硬化物及びその製造方法、樹脂パターン製造方法、並びに、上記硬化物を有する液晶表示装置、有機EL表示装置及びタッチパネル表示装置を提供することを目的とする。 本発明の感光性樹脂組成物は、(成分A)金属酸化物粒子、(成分B)式(I)で表される化合物、(成分C)溶剤、(成分D)酸基が酸分解性基で保護された基を有する構成単位を含む重合体、及び、(成分E)光酸発生剤、を含有することを特徴とする。式(I)中、Ar1及びAr2はそれぞれ独立に、アリーレン基を表し、R1及びR2の少なくとも1つは、架橋性基を有する一価の有機基であり、R3及びR4はそれぞれ独立に、一価の置換基を表し、p及びqはそれぞれ独立に、0~4の整数を表す。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)