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1. (WO2014198107) METHOD FOR CLEANING A SUBSTRATE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/198107 International Application No.: PCT/CN2013/088099
Publication Date: 18.12.2014 International Filing Date: 29.11.2013
IPC:
H01L 21/00 (2006.01) ,H01L 21/304 (2006.01) ,B08B 3/00 (2006.01) ,B08B 3/04 (2006.01) ,B08B 3/08 (2006.01)
Applicants: BOE TECHNOLOGY GROUP CO., LTD.[CN/CN]; No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015, CN
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD.[CN/CN]; Xinzhan Industrial Park Hefei City, Anhui 230011, CN
Inventors: ZHANG, Yi; CN
WENG, Mingting; CN
CHENG, Dafu; CN
GUO, Zhiguang; CN
YIN, Xilei; CN
Agent: LIU, SHEN & ASSOCIATES; 10th Floor, Building 1, 10 Caihefang Road, Haidian District Beijing 100080, CN
Priority Data:
201310231298.209.06.2013CN
Title (EN) METHOD FOR CLEANING A SUBSTRATE
(FR) PROCÉDÉ DE NETTOYAGE D'UN SUBSTRAT
(ZH) 基板的清洗方法
Abstract: front page image
(EN) A method for cleaning a substrate, comprising: pre-heat treating the substrate; using a cleaning agent to clean the pretreated substrate; rinsing the cleaned substrate.
(FR) L'invention concerne un procédé de nettoyage d'un substrat, qui comprend les étapes suivantes : le traitement par préchauffage du substrat ; l'utilisation d'un agent de nettoyage pour nettoyer le substrat prétraité ; le rinçage du substrat nettoyé.
(ZH) 一种基板的清洗方法,包括:对基板进行预加热处理;采用清洗剂对预处理过的基板进行清洗;对清洗后的基板进行冲洗。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)