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1. (WO2014196377) SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM

Pub. No.:    WO/2014/196377    International Application No.:    PCT/JP2014/063676
Publication Date: Fri Dec 12 00:59:59 CET 2014 International Filing Date: Sat May 24 01:59:59 CEST 2014
IPC: C23C 14/34
B22F 3/00
B22F 3/14
C22C 1/05
C22C 5/04
C22C 32/00
Applicants: JX NIPPON MINING & METALS CORPORATION
JX日鉱日石金属株式会社
Inventors: SATO Atsushi
佐藤 敦
Title: SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM
Abstract:
A sintered sputtering target containing a Fe-Pt alloy and a non-magnetic material as the main components, said sintered sputtering target being characterized in that at least C (carbon) is contained as the non-magnetic material, an additional trace element other than the above-mentioned main components is contained in an amount of 50 to 5000 ppm by mass, and the standard free energy of formation (ΔG°) of the additional trace element per 1 mole of carbon in a carbide is -5000 [cal/mol] or less. The present invention addresses the problem of providing a sputtering target which undergoes the formation of particles in a greatly reduced amount upon sputtering and contains a Fe-Pt alloy and a non-magnetic material as the main components.