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1. (WO2014196154) PHOTOSENSITIVE ELECTROCONDUCTIVE FILM, METHOD FOR FORMING ELECTROCONDUCTIVE PATTERN USING SAME, AND ELECTROCONDUCTIVE PATTERN SUBSTRATE

Pub. No.:    WO/2014/196154    International Application No.:    PCT/JP2014/002770
Publication Date: Fri Dec 12 00:59:59 CET 2014 International Filing Date: Wed May 28 01:59:59 CEST 2014
IPC: G03F 7/004
G03F 7/027
G03F 7/033
G06F 3/041
H01B 5/14
Applicants: HITACHI CHEMICAL COMPANY, LTD.
日立化成株式会社
Inventors: EBIHARA, Masahiko
海老原 雅彦
YAMAZAKI, Hiroshi
山崎 宏
MURAKAMI, Yasuharu
村上 泰治
TANAKA, Hiroyuki
田仲 裕之
MUKAI, Ikuo
向 郁夫
SASAHARA, Naoki
笹原 直樹
Title: PHOTOSENSITIVE ELECTROCONDUCTIVE FILM, METHOD FOR FORMING ELECTROCONDUCTIVE PATTERN USING SAME, AND ELECTROCONDUCTIVE PATTERN SUBSTRATE
Abstract:
A photosensitive electroconductive film provided with a support film, an electroconductive film provided on the support film, and a photosensitive resin layer provided on the electroconductive film, the photosensitive resin layer containing (A) a binder polymer, (B) a photopolymerizable compound, and (C) a photopolymerization initiator, and the hydroxyl value of the dry solids content of the photosensitive resin layer being equal to or less than 40 mgKOH/g.