Search International and National Patent Collections

1. (WO2014195518) GAS CONFIGURATION FOR MAGNETRON DEPOSITION SYSTEMS

Pub. No.:    WO/2014/195518    International Application No.:    PCT/EP2014/061950
Publication Date: Fri Dec 12 00:59:59 CET 2014 International Filing Date: Tue Jun 10 01:59:59 CEST 2014
IPC: H01J 37/32
H01J 37/34
Applicants: SOLERAS ADVANCED COATINGS BVBA
Inventors: DE BOSSCHER, Wilmert
Title: GAS CONFIGURATION FOR MAGNETRON DEPOSITION SYSTEMS
Abstract:
A magnetron deposition system for depositing material is disclosed. The magnetron deposition system comprises at least two magnetron units, each magnetron unit comprising a magnet configuration, the at least two magnetron units being arranged so that the magnetron units share a common plasma in a plasma region between the at least two magnetron units. The system furthermore comprises at least one gas inlet for supplying a gas. The at least one gas inlet for supplying a gas and the at least two magnetron units thereby are arranged for directly injecting the first gas in the plasma region between the two magnetron units.