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Machine translation
1. (WO2014193165) PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING SPACER, AND SPACER PREPARED THEREFROM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/193165    International Application No.:    PCT/KR2014/004775
Publication Date: 04.12.2014 International Filing Date: 28.05.2014
IPC:
G03F 7/032 (2006.01), G02F 1/13 (2006.01)
Applicants: DONGWOO FINE-CHEM CO., LTD. [KR/KR]; (Sinheung-dong) 132, Yakchon-ro Iksan-si Jeollabuk-do 570-977 (KR)
Inventors: CHOI, Hwa Sup; (KR).
KIM, Jae Sung; (KR).
INOUE, Katsuharu; (KR)
Agent: DOOHO IP LAW FIRM; (Seocho-dong, Daehyun Blue Tower) 7th Floor, 1, Gangnam-daero 51-gil Seocho-gu Seoul 06628 (KR)
Priority Data:
10-2013-0060138 28.05.2013 KR
10-2013-0163890 26.12.2013 KR
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING SPACER, AND SPACER PREPARED THEREFROM
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE PERMETTANT DE FORMER UN ESPACEUR ET ESPACEUR PRÉPARÉ À PARTIR DE CELLE-CI
(KO) 스페이서 형성용 감광성 수지 조성물 및 이로부터 제조되는 스페이서
Abstract: front page image
(EN)The present invention relates to a photosensitive resin composition for forming a spacer, and more specifically, to a photosensitive resin composition comprising an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator and a solvent, wherein the alkali-soluble resin comprises an alicyclic epoxy group and an aliphatic epoxy group, thereby allowing a spacer to be prepared having an excellent elastic recovery rate and having a hardness enabling little deformation from external pressure.
(FR)La présente invention concerne une composition de résine photosensible permettant de former un espaceur, et plus particulièrement, une composition de résine photosensible comprenant une résine alcalino-soluble, un composé photopolymérisable, un initiateur de photopolymérisation et un solvant, la résine alcalino-soluble comprenant un groupe époxy alicyclique et un groupe époxy aliphatique, ce qui permet à l'espaceur d'être préparé avec un excellent taux de recouvrance élastique et une dureté qui lui permet d'être peu sujet aux déformations dues à des pressions externes.
(KO)본 발명은 스페이서 형성용 감광성 수지 조성물에 관한 것으로서, 보다 상세하게는, 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제 및 용매를 포함하며, 상기 알칼리 가용성 수지는 지환족 에폭시기 및 지방족 에폭시기를 포함함으로써, 우수한 탄성 회복률을 가지며, 외부 압력에 변형이 적은 딱딱한 특성을 갖는 스페이서를 제조할 수 있는 감광성 수지 조성물에 관한 것이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)