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1. (WO2014193138) SUBSTRATE SUPPORT DEVICE AND SUBSTRATE TREATMENT DEVICE COMPRISING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/193138 International Application No.: PCT/KR2014/004707
Publication Date: 04.12.2014 International Filing Date: 27.05.2014
IPC:
H01L 21/683 (2006.01) ,F16C 29/02 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
F MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
16
ENGINEERING ELEMENTS OR UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
C
SHAFTS; FLEXIBLE SHAFTS; MECHANICAL MEANS FOR TRANSMITTING MOVEMENT IN A FLEXIBLE SHEATHING; ELEMENTS OF CRANKSHAFT MECHANISMS; PIVOTS; PIVOTAL CONNECTIONS; ROTARY ENGINEERING ELEMENTS OTHER THAN GEARING, COUPLING, CLUTCH OR BRAKE ELEMENTS; BEARINGS
29
Bearings for parts moving only linearly
02
Sliding-contact bearings
Applicants: JUSUNG ENGINEERING CO., LTD.[KR/KR]; 240, Opo-ro, Opo-eup Gwangju-si Gyeonggi-do 464-892, KR
Inventors: CHOI, Jong Sung; KR
KWON, Bong Sung; KR
RYU, Ji Hwan; KR
LEE, Myung Jin; KR
JUNG, Suk Chul; KR
Agent: ASTRAN INT'L IP GROUP; (ShinSung Building, Yeoksam-dong) 5th Floor, 233, Yeoksam-ro Gangnam-gu, Seoul 135-514, KR
Priority Data:
10-2013-006067628.05.2013KR
Title (EN) SUBSTRATE SUPPORT DEVICE AND SUBSTRATE TREATMENT DEVICE COMPRISING SAME
(FR) DISPOSITIF DE SUPPORT DE SUBSTRAT ET DISPOSITIF DE TRAITEMENT DE SUBSTRAT LE COMPRENANT
(KO) 기판 지지 장치 및 이를 포함하는 기판 처리 장치
Abstract:
(EN) The present invention provides a substrate support device capable of preventing damage to a plurality of lift pins for supporting a substrate, and a substrate treatment device comprising the same. The substrate support device according to the present invention comprises: a suscepter on which a substrate is placed; a lift pin provided so as to vertically pass through the suscepter and for supporting the substrate; and a bushing provided to the suscepter so as to allow a lift pin to be inserted therein, wherein the bushing comprises a self-lubricating material, thereby preventing damage to the lift pin.
(FR) La présente invention porte sur un dispositif de support de substrat apte à empêcher un endommagement sur une pluralité de broches d’élévation pour porter un substrat, et sur un dispositif de traitement de substrat comprenant ce dernier. Le dispositif de support de substrat selon la présente invention comprend : un suscepteur sur lequel un substrat est placé ; une broche d’élévation agencée afin de traverser verticalement le suscepteur et pour porter le substrat ; et une douille agencée sur le suscepteur afin de permettre à une broche d’élévation d’être introduite en son sein, la douille comprenant un matériau auto-lubrifiant, empêchant ainsi un endommagement sur la broche d’élévation.
(KO) 본 발명은 기판을 지지하는 복수의 리프트 핀의 파손을 방지할 수 있는 기판 지지 장치 및 이를 포함하는 기판 처리 장치를 제공하는 것으로, 본 발명에 따른 기판 지지 장치는 기판이 안착되는 서셉터; 상기 서셉터를 수직 관통하도록 설치되어 상기 기판을 지지하는 리프트 핀; 및 상기 리프트 핀이 삽입되도록 상기 서셉터에 설치된 부싱을 포함하며, 상기 부싱은 자기 윤활성 재질을 포함하여 이루어져 상기 리프트 핀의 손상을 방지한다.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)