Search International and National Patent Collections

1. (WO2014192999) DEFECT INSPECTION SYSTEM FOR INSPECTING OBJECT HAVING IRREGULAR PATTERNS

Pub. No.:    WO/2014/192999    International Application No.:    PCT/KR2013/004723
Publication Date: Fri Dec 05 00:59:59 CET 2014 International Filing Date: Thu May 30 01:59:59 CEST 2013
IPC: G01N 21/958
Applicants: SEMISYSCO CO., LTD
(주)쎄미시스코
Inventors: LEE, Soon-Jong
이순종
WOO, Bong-Joo
우봉주
CHOI, Seong-jin
최성진
WON, Jun-yeon
원준연
Title: DEFECT INSPECTION SYSTEM FOR INSPECTING OBJECT HAVING IRREGULAR PATTERNS
Abstract:
Disclosed is a system for inspecting an object having irregular patterns, for example, for inspecting a waviness defect in a transparent film. The defect inspection system for inspecting a waviness defect in an object having a non-uniform thickness comprises a light source for outputting planar light and a light conversion unit for converting the planar light outputted from the light source into point light, wherein the light outputted from the light source is incident on the object through the light conversion unit.