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1. (WO2014192671) PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSPACER, PROTECTIVE FILM FOR COLOR FILTERS, AND PROTECTIVE FILM OR INSULATING FILM OF TOUCH PANEL
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/192671 International Application No.: PCT/JP2014/063779
Publication Date: 04.12.2014 International Filing Date: 26.05.2014
IPC:
G03F 7/075 (2006.01) ,G02F 1/1339 (2006.01) ,G03F 7/004 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
075
Silicon-containing compounds
G PHYSICS
02
OPTICS
F
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH IS MODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THE DEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY, COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g. SWITCHING, GATING, MODULATING OR DEMODULATING; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
1
Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
01
for the control of the intensity, phase, polarisation or colour
13
based on liquid crystals, e.g. single liquid crystal display cells
133
Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
1333
Constructional arrangements
1339
Gaskets; Spacers; Sealing of the cell
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
04
Chromates
Applicants: SANYO CHEMICAL INDUSTRIES, LTD.[JP/JP]; 11-1, Ikkyonomotocho, Higashiyama-ku, Kyoto-shi, Kyoto 6050995, JP
Inventors: YAMASHITA Mayuko; JP
SAKAI Yu; JP
Agent: YASUTOMI & ASSOCIATES; 5-36, Miyahara 3-chome, Yodogawa-ku, Osaka-shi, Osaka 5320003, JP
Priority Data:
2013-11368030.05.2013JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSPACER, PROTECTIVE FILM FOR COLOR FILTERS, AND PROTECTIVE FILM OR INSULATING FILM OF TOUCH PANEL
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE, PHOTOESPACEUR, FILM PROTECTEUR POUR FILTRES COLORÉS ET FILM PROTECTEUR OU FILM ISOLANT D'ÉCRAN TACTILE
(JA) 感光性樹脂組成物、フォトスペーサー、カラーフィルター用保護膜、及び、タッチパネルの保護膜もしくは絶縁膜
Abstract:
(EN) The objective of the present invention is to provide a photosensitive resin composition which has high developability and provides a cured product that has excellent elastic modulus recovery characteristics and adhesion, and which enables the formation of a highly fine spacer. A photosensitive resin composition according to the present invention is characterized by containing (A) a hydrophilic resin, (B) a polyfunctional (meth)acrylate, (C) a photopolymerization initiator, (D) a solvent having an HLB of from 8.0 to 30.0 (inclusive) and (E) a compound which is a condensation product that has a compound represented by general formula (1) as an essential constituent monomer. (In formula (1), R1 represents one or more organic groups which are selected from the group consisting of a (meth)acryloyloxyalkyl group, a glycidoxyalkyl group, a mercaptoalkyl group and an aminoalkyl group, in each of which an alkyl group having 1-6 carbon atoms; R2 represents an aliphatic saturated hydrocarbon group having 1-12 carbon atoms or an aromatic hydrocarbon group having 6-12 carbon atoms; R3 represents an alkyl group having 1-4 carbon atoms; M represents one or more atoms selected from the group consisting of a silicon atom, a titanium atom and a zirconium atom; and m represents 0 or 1.)
(FR) La présente invention a pour objet une composition de résine photosensible qui a une grande aptitude au développement, qui procure un produit durci présentant d'excellentes caractéristiques de récupération de module d'élasticité et adhérence, et qui permet la formation d'un espaceur très fin. Une composition de résine photosensible d'après la présente invention est caractérisée en ce qu'elle contient (A) une résine hydrophile, (B) un (méth)acrylate polyfonctionnel, (C) un initiateur de photopolymérisation, (D) un solvant contenant un HLB se situant dans la plage de 8,0 à 30,0 (limites comprises) et (E) un composé qui est un produit de condensation qui contient, en qualité de monomère composant principal, un composé représenté par la formule générale (1). (Dans la formule (1), R1 représente un ou plusieurs groupes organiques qui sont sélectionnés dans le groupe constitué d'un groupe (méth)acryloyloxyalkylique, d'un groupe glycidoxyalkyle, d'un groupe mercaptoalkyle et d'un groupe aminoalkyle, chacun d'eux contenant un groupe alkyle comportant de 1 à 6 atomes de carbone ; R2 représente un groupe hydrocarbure aliphatique saturé comportant de 1 à 12 atomes de carbone ou un groupe hydrocarbure aromatique comportant de 6 à 12 atomes de carbone ; R3 représente un groupe alkyle comportant de 1 à 4 atomes de carbone ; M représente un ou plusieurs atomes sélectionnés dans le groupe constitué d'un atome de silicium, d'un atome de titane et d'un atome de zirconium ; et m représente 0 ou 1.)
(JA) 本発明の課題は、高現像性であり、かつ硬化物が優れた弾性回復特性と密着性を有し、高精細なスペーサーの形成が可能な感光性樹脂組成物を提供することである。 本発明の感光性樹脂組成物は、親水性樹脂(A)、多官能(メタ)アクリレート(B)、光重合開始剤(C)、HLBが8.0以上30.0以下である溶剤(D)および下記一般式(1)で示される化合物を必須構成単量体とする縮合物である化合物(E)を含むことを特徴とする。 [式(1)中、R1は、アルキル基の炭素数が1~6の(メタ)アクリロイロキシアルキル基、グリシドキシアルキル基、メルカプトアルキル基およびアミノアルキル基からなる群から選ばれる1種以上の有機基、R2は炭素数1~12の脂肪族飽和炭化水素基または炭素数6~12の芳香族炭化水素基、R3は炭素数1~4のアルキル基、Mは珪素原子、チタン原子およびジルコニウム原子からなる群から選ばれる1種以上の原子であり、mは0または1である。]
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)