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1. (WO2014192266) ETCHING COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/192266 International Application No.: PCT/JP2014/002702
Publication Date: 04.12.2014 International Filing Date: 22.05.2014
IPC:
H01L 21/308 (2006.01) ,C09K 13/04 (2006.01) ,C09K 13/08 (2006.01) ,C09K 13/10 (2006.01) ,H01L 31/18 (2006.01)
Applicants: HITACHI CHEMICAL COMPANY, LTD.[JP/JP]; 9-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1006606, JP
Inventors: KODAMA, Shunsuke; JP
TSUKAHARA, Tomoaki; JP
KUMASHIRO, Yasushi; JP
Agent: WATANABE, Kihei; Shibashin Kanda Bldg. 3rd Floor, 26, Kanda Suda-cho 1-chome, Chiyoda-ku, Tokyo 1010041, JP
Priority Data:
2013-11609831.05.2013JP
2013-11609931.05.2013JP
Title (EN) ETCHING COMPOSITION
(FR) COMPOSITION DE DE GRAVURE
(JA) エッチング組成物
Abstract:
(EN) Provided is an etching composition that contains: a salt that comprises a cation and an anion having a structure in which a fluorine atom and a phosphorus atom are joined by a single bond; and a solvent.
(FR) L'invention concerne une composition de gravure qui contient : un sel qui comprend un cation et un anion ayant une structure dans laquelle un atome de fluor et un atome de phosphore sont liés par une liaison simple ; et un solvant.
(JA) フッ素原子とリン原子が単結合で結合した構造を有する陰イオンと、陽イオンからなる塩と、溶媒と、を含有するエッチング組成物。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)