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1. (WO2014191622) BARRIER, CARRIER ARRANGEMENT AND METHOD FOR PREVENTING MATERIAL GROWTH
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2014/191622 International Application No.: PCT/FI2014/050419
Publication Date: 04.12.2014 International Filing Date: 27.05.2014
IPC:
C23C 16/458 (2006.01) ,C23C 16/455 (2006.01) ,C23C 16/04 (2006.01)
Applicants: BENEQ OY[FI/FI]; Ensimmäinen savu FI-01510 Vantaa, FI
Inventors: MAULA, Jarmo; FI
PELTONIEMI, Janne; FI
LI, Shuo; FI
Agent: KOLSTER OY AB; (Iso Roobertinkatu 23) P.O.Box 148 FI-00121 Helsinki, FI
Priority Data:
2013558429.05.2013FI
Title (EN) BARRIER, CARRIER ARRANGEMENT AND METHOD FOR PREVENTING MATERIAL GROWTH
(FR) BARRIÈRE, AGENCEMENT SUPPORT ET PROCÉDÉ DE PRÉVENTION DE CROISSANCE D'UNE MATIÈRE
Abstract: front page image
(EN) The invention relates to a mask, carrier arrangement, method and use for preventing material growth on a portion of a surface (4, 6, 10, 12) of a substrate (2, 8) during processing of the substrate (2, 8) by subjecting the surface (4,6, 10, 12) of the substrate (2, 8) to successive surface reactions of at least a first precursor and a second precursor. The mask being arranged to be placed on the substrate (2, 8) such that it covers the portion of the surface (4, 6, 10, 12) of the substrate (2, 8). In the present invention the mask comprises a porous element (20, 24, 29, 32, 42, 44, 54) arranged to be provided against at least part of the portion of the surface (4, 6, 10, 12) of the substrate (2, 8).
(FR) La présente invention concerne un masque, un agencement support, un procédé et une utilisation destinés à prévenir la croissance d'une matière sur une portion d'une surface (4, 6, 10, 12) d'un substrat (2, 8) pendant un traitement du substrat (2, 8) par soumission de la surface (4, 6, 10, 12) du substrat (2, 8) à des réactions de surface successives d'au moins un premier précurseur et un second précurseur. Le masque est agencé de façon à être placé sur le substrat (2, 8), de sorte qu'il couvre la portion de la surface (4, 6, 10, 12) du substrat (2, 8). Le masque selon la présente invention comprend un élément poreux (20, 24, 29, 32, 42, 44, 54) agencé de façon à être disposé contre au moins une partie de la portion de la surface (4, 6, 10, 12) du substrat (2, 8).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)