Processing

Please wait...

PATENTSCOPE will be unavailable a few hours for maintenance reason on Tuesday 27.07.2021 at 12:00 PM CEST
Settings

Settings

Goto Application

1. WO2014191163 - METHOD OF SIMULATING FORMATION OF LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS

Publication Number WO/2014/191163
Publication Date 04.12.2014
International Application No. PCT/EP2014/059097
International Filing Date 05.05.2014
IPC
G03F 7/00 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
CPC
G03F 7/0002
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
G06F 2119/18
GPHYSICS
06COMPUTING; CALCULATING; COUNTING
FELECTRIC DIGITAL DATA PROCESSING
2119Details relating to the type or aim of the analysis or the optimisation
18Manufacturability analysis or optimisation for manufacturability
G06F 30/20
GPHYSICS
06COMPUTING; CALCULATING; COUNTING
FELECTRIC DIGITAL DATA PROCESSING
30Computer-aided design [CAD]
20Design optimisation, verification or simulation
G06F 30/398
GPHYSICS
06COMPUTING; CALCULATING; COUNTING
FELECTRIC DIGITAL DATA PROCESSING
30Computer-aided design [CAD]
30Circuit design
39Circuit design at the physical level
398Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]
Applicants
  • ASML NETHERLANDS B.V. [NL]/[NL]
Inventors
  • WUISTER, Sander
  • DRUZHININA, Tamara
  • VAN MALE, Jan
  • KLEIN-WOLTERINK, Joanne
  • AMBESI, Davide
Agents
  • WEENINK, Willem
Priority Data
61/829,11830.05.2013US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD OF SIMULATING FORMATION OF LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
(FR) PROCÉDÉ DE SIMULATION DE LA FORMATION DE MOTIFS LITHOGRAPHIQUES PAR AUTO-ASSEMBLAGE DE COPOLYMÈRES À BLOCS
Abstract
(EN)
A method of determining an uncertainty in the position of a domain within a self- assembly block copolymer (BCP) feature. The method includes simulating a BCP feature, calculating a minimum energy position of a first domain within the simulated BCP feature, simulating the application of a potential that causes the position of the first domain to be displaced from the minimum energy position, simulating release of the potential back toward the minimum energy, recording a plurality of energies of the BCP feature during the release and recording at each of the plurality of energies a displacement of the first domain from the minimum energy position, calculating, from the recorded energies and recorded displacements, a probability distribution indicating a probability of the first domain being displaced from the minimum energy position, and, from the probability distribution, calculating an uncertainty in the position of the first domain within the BCP feature.
(FR)
L'invention concerne un procédé de détermination d'une incertitude dans la position d'un domaine dans un motif de copolymère à blocs (CPB) à auto-assemblage. Le procédé comprend la simulation d'un motif de CPB, le calcul d'une position d'énergie minimale d'un premier domaine dans le motif de CPB simulé, la simulation de l'application d'un potentiel qui provoque le déplacement depuis la position du premier domaine de la position d'énergie minimale, la simulation de la libération du potentiel pour revenir à l'énergie minimale, l'enregistrement d'une pluralité d'énergies de motif de CPB pendant la libération et l'enregistrement à chacune des énergies de la pluralité d'un déplacement du premier domaine depuis la position d'énergie minimale, le calcul, à partir des énergies enregistrées et des déplacements enregistrés, d'une distribution de probabilités indiquant une probabilité pour que le premier domaine soit déplacé de la position d'énergie minimale, et, d'après la distribution de probabilités, le calcul d'une incertitude dans la position du premier domaine à l'intérieur du motif de CPB.
Also published as
Latest bibliographic data on file with the International Bureau