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1. (WO2014189790) SUBSTRATE PROCESSING BASED ON RESISTIVITY MEASUREMENTS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/189790    International Application No.:    PCT/US2014/038455
Publication Date: 27.11.2014 International Filing Date: 16.05.2014
IPC:
H01L 31/18 (2006.01), H01L 21/67 (2006.01), H01L 21/66 (2006.01)
Applicants: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. [US/US]; 35 Dory Road Gloucester, Massachusetts 01930 (US)
Inventors: BATEMAN, Nicholas P. T.; (US).
SULLIVAN, Paul; (US)
Agent: DAISAK, Daniel N.; (US)
Priority Data:
13/897,698 20.05.2013 US
Title (EN) SUBSTRATE PROCESSING BASED ON RESISTIVITY MEASUREMENTS
(FR) TRAITEMENT DE SUBSTRAT À PARTIR DE MESURES DE RÉSISTIVITÉ
Abstract: front page image
(EN)The resistivity of a silicon boule may vary along its length, thereby making a uniform ion implantation process sub-optimal. A system and method for measuring a resistivity of a substrate, and processing the substrate based on that measured resistivity is disclosed. The system includes a resistivity measurement system, a controller and an ion implanting system, where the controller configures the ion implantation process based on the measured resistivity of the substrate.
(FR)La résistivité d'un lingot de silicium peut varier sur sa longueur, ce qui rend un procédé d'implantation ionique uniforme sous-optimal. L'invention concerne un système et un procédé de mesure d'une résistivité d'un substrat et le traitement du substrat en fonction de ladite résistivité mesurée. Le système comprend un système de mesure de résistivité, un dispositif de commande et un système d'implantation ionique, le dispositif de commande configurant le procédé d'implantation ionique en fonction de la résistivité mesurée du substrat.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)