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1. (WO2014189339) DEPOSITION METHOD FOR TUNGSTEN-CONTAINING FILM USING TUNGSTEN COMPOUND AND PRECURSOR COMPOSITION FOR DEPOSITING TUNGSTEN-CONTAINING FILM, COMPRISING TUNGSTEN COMPOUND
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/189339    International Application No.:    PCT/KR2014/004666
Publication Date: 27.11.2014 International Filing Date: 26.05.2014
IPC:
C23C 16/44 (2006.01), C23C 16/06 (2006.01)
Applicants: UP CHEMICAL CO., LTD. [KR/KR]; (Chilgoe-dong), 81, Sandan-ro 197beon-gil, Pyeongtaek-si Gyeonggi-do 459-050 (KR)
Inventors: HAN, Won Seok; (KR).
YOO, Beom-Sang; (KR).
LEE, Hong-Joo; (KR)
Agent: MAPS INTELLECTUAL PROPERTY LAW FIRM; (Jeil Pharmaceutical Bldg., Banpo-dong), 4F, 343, Sapyoung-daero, Seocho-gu Seoul 137-810 (KR)
Priority Data:
10-2013-0059238 24.05.2013 KR
10-2014-0062800 26.05.2014 KR
Title (EN) DEPOSITION METHOD FOR TUNGSTEN-CONTAINING FILM USING TUNGSTEN COMPOUND AND PRECURSOR COMPOSITION FOR DEPOSITING TUNGSTEN-CONTAINING FILM, COMPRISING TUNGSTEN COMPOUND
(FR) PROCÉDÉ DE DÉPÔT POUR FILM CONTENANT DU TUNGSTÈNE UTILISANT UN COMPOSÉ DE TUNGSTÈNE ET UNE COMPOSITION DE PRÉCURSEUR POUR DÉPOSER UN FILM CONTENANT DU TUNGSTÈNE, COMPRENANT UN COMPOSÉ DE TUNGSTÈNE
(KO) 텅스텐 화합물을 이용한 텅스텐-함유 막의 증착 방법 및 상기 텅스텐 화합물을 포함하는 텅스텐-함유 막 증착용 전구체 조성물
Abstract: front page image
(EN)The present invention relates to a deposition method for a tungsten-containing film using a tungsten compound and a precursor composition for depositing the tungsten-containing film, comprising the tungsten compound.
(FR)La présente invention concerne un procédé de dépôt pour un film contenant du tungstène utilisant un composé de tungstène et une composition de précurseur permettant de déposer le film contenant du tungstène, comprenant le composé de tungstène.
(KO)텅스텐 화합물을 이용한 텅스텐-함유 막의 증착 방법 및 상기 텅스텐 화합물을 포함하는 텅스텐-함유 막 증착용 전구체 조성물에 관한 것이다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)