WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2014189191) GRAPHENE-CLEANING PROCESS AND DEVICE COMPRISING GRAPHENE TREATED THEREBY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/189191    International Application No.:    PCT/KR2013/011732
Publication Date: 27.11.2014 International Filing Date: 17.12.2013
IPC:
B08B 3/08 (2006.01), B08B 1/00 (2006.01)
Applicants: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY [KR/KR]; 100 Jang-dong Yuseong-gu Daejeon 305-343 (KR)
Inventors: CHOI, Won Jin; (KR).
LEE, Jeong O; (KR).
LEE, Young Kuk; (KR).
CHUNG, Yoon Jang; (KR).
PARK, Se Rin; (KR)
Agent: LEE, Won-Hee; 8th Fl., Sung-ji Heights II 642-16 Yoksam-dong Kangnam-gu Seoul 135-080 (KR)
Priority Data:
10-2013-0056770 20.05.2013 KR
Title (EN) GRAPHENE-CLEANING PROCESS AND DEVICE COMPRISING GRAPHENE TREATED THEREBY
(FR) PROCESSUS DE NETTOYAGE DE GRAPHÈNE ET DISPOSITIF COMPRENANT DU GRAPHÈNE TRAITÉ DE CETTE FAÇON
(KO) 그래핀 클리닝 공정 및 이에 의해 처리된 그래핀을 포함하는소자
Abstract: front page image
(EN)The present invention relates to a graphene-cleaning process using electrostatic force, and a graphene device treated thereby. More particularly, the present invention provides a graphene-cleaning process comprising the steps of: removing, using an organic solvent, a graphene support layer having a graphene layer formed on one side thereof; and removing a graphene support layer residue, by positioning a cleaning member, at a distance allowing for interaction, on the graphene layer from which the graphene support layer has been removed and then moving the cleaning member on the graphene layer, and a device comprising graphene cleaned by the process. According to the present invention, it is possible to uniformly improve the performance of graphene on a large scale without additional processes or costs. Furthermore, the cleaned graphene device which is manufactured in the present invention has excellent electrical properties, as well as excellent mechanical and optical properties.
(FR)La présente invention concerne un processus de nettoyage de graphène qui utilise une force électrostatique et un dispositif de graphène traité de cette façon. Plus particulièrement, la présente invention concerne un processus de nettoyage de graphène qui comprend les étapes consistant à : retirer, au moyen d'un solvant organique, une couche de support de graphène comportant une couche de graphène, formée sur un de ses côtés ; et éliminer un résidu de couche de support de graphène en mettant en place un élément de nettoyage, à une distance permettant une interaction, sur la couche de graphène d'où l'on a retiré la couche de support de graphène et en déplaçant ensuite l'élément de nettoyage sur la couche de graphène. L'invention concerne aussi un dispositif comprenant du graphène nettoyé suivant le processus. Selon la présente invention, il est possible d'améliorer uniformément les performances du graphène à grande échelle, sans processus ni coûts supplémentaires. En outre, le dispositif de graphène nettoyé, fabriqué selon la présente invention, présente d'excellentes propriétés électriques, ainsi que d'excellentes propriétés mécaniques et optiques.
(KO)본 발명은 정전기적인 힘을 이용한 그래핀 클리닝 공정 및 이에 의해 처리된 그래핀 소자에 관한 것으로서, 구체적으로는 유기용매를 사용하여 한쪽 면에 그래핀 층이 형성되어 있는 그래핀 지지층을 제거하는 단계와 그래핀 지지층이 제거된 그래핀 층 상에 상호작용이 가능한 거리에 클리닝 부재를 위치시켜서 상기 클리닝 부재를 그래핀 층 상에서 이동시킴으로써 그래핀 지지층 잔사를 제거하는 단계를 포함하는 그래핀 클리닝 방법 및 상기 방법에 의해 클리닝 처리된 그래핀을 포함하는 소자를 제공한다. 본 발명에 따르면, 추가적인 공정이나 비용없이 대면적으로 그래핀의 성능을 균일하게 향상시킬 수 있으며, 본 발명으로 만들어진 클리닝된 그래핀 소자는 우수한 전기적 특성 및 기계적, 광학적 특성을 가진다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)