WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2014187580) SAMPLE DISC FOR ULTRASONIC DISC TESTING EQUIPMENT
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/187580    International Application No.:    PCT/EP2014/053091
Publication Date: 27.11.2014 International Filing Date: 18.02.2014
IPC:
G01N 29/30 (2006.01)
Applicants: SIEMENS AKTIENGESELLSCHAFT [DE/DE]; Wittelsbacherplatz 2 80333 München (DE)
Inventors: HEINRICH, Werner; (DE).
KOLK, Karsten; (DE).
LOHMANN, Hans-Peter; (DE).
VRANA, Johannes; (DE).
BÜCHNER, Uwe; (DE).
MOOSHOFER, Hubert; (DE)
Priority Data:
10 2013 209 615.1 23.05.2013 DE
Title (DE) MUSTERSCHEIBE FÜR ULTRASCHALL-SCHEIBENPRÜFANLAGEN
(EN) SAMPLE DISC FOR ULTRASONIC DISC TESTING EQUIPMENT
(FR) MODÈLES DE DISQUES POUR DES INSTALLATIONS D'ESSAI DE DISQUES À ULTRASONS
Abstract: front page image
(DE)Die vorliegende Erfindung betrifft eine Musterscheibe für Ultraschall-Scheibenprüfanlagen, deren Herstellung und deren Verwendung, wobei in der Musterscheibe (1) eine sich entlang dem Radius (R) und entlang der Symmetrieachse (S) erstreckende Seitenfläche (9) in der Musterscheibe (1) freigelegt ist, durch die hindurch mindestens ein flächiger Musterfehler (M) geschaffen ist.
(EN)The present invention relates to a sample disc for ultrasonic disc testing equipment, to the production of said disc and to the use thereof. In said sample disc (1) a lateral face (9) extending along the radius (R) and along the axis of symmetry (S) is exposed in the disc (1) and at least one planar sample defect (M) is created through said lateral face.
(FR)L'invention concerne un modèle de disque pour des installations d'essai de disques à ultrasons, leur production et leur utilisation. Une surface latérale (9) s'étendant le long du rayon (R) et le long de l'axe de symétrie (S) dans le modèle de disque (1) est libérée dans le modèle de disque (1), au travers de laquelle au moins un modèle d'erreur étendu (M) est créé.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: German (DE)
Filing Language: German (DE)