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Machine translation
1. (WO2014186224) APPARATUS FOR SECURING COMPONENTS IN AN ELECTRET CONDENSER MICROPHONE (ECM)
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/186224    International Application No.:    PCT/US2014/037481
Publication Date: 20.11.2014 International Filing Date: 09.05.2014
IPC:
H04R 19/04 (2006.01), H01L 29/84 (2006.01)
Applicants: KNOWLES ELECTRONICS, LLC [US/US]; 1151 Maplewood Drive Itasca, Illinois 60143 (US)
Inventors: NAYLOR, Felix Matthew; (US)
Agent: KRATZ, Rudy; Fitch, Even, Tabin & Flannery, LLP 120 S. LaSalle Street Suite 1600 Chicago, Illinois 60603 (US)
Priority Data:
61/822,590 13.05.2013 US
Title (EN) APPARATUS FOR SECURING COMPONENTS IN AN ELECTRET CONDENSER MICROPHONE (ECM)
(FR) APPAREIL D'IMMOBILISATION DE COMPOSANTS DANS UN MICROPHONE À ÉLECTRET (ECM)
Abstract: front page image
(EN)An Electret Condenser Microphone (ECM) motor apparatus includes a diaphragm ring support structure, a charge plate, and at least one stitch. The diaphragm ring support structure defines an opening there through. The charge plate is disposed within the opening. The at least one stitch is coupled to the diaphragm ring support structure to the charge plate. The diaphragm is disposed adjacent to and in a generally parallel relationship to the charge plate. The stitch is configured to hold the charge plate and the diaphragm ring, and the stitch is configured to maintain a constant or nearly constant distance between the charge plate and the diaphragm in the absence of sound energy.
(FR)L'invention concerne un appareil moteur de microphone à électret (ECM) comprenant une structure de soutien de bague de membrane, une plaque de charge et au moins une couture. La structure de soutien de bague de membrane définit une ouverture à travers celle-ci. La plaque de charge est disposée à l'intérieur de l'ouverture. La ou les coutures sont couplées à la structure de soutien de bague de membrane et à la plaque de charge. La membrane est disposée au voisinage de, et en relation généralement parallèle à, la plaque de charge. La couture est configurée pour maintenir la plaque de charge et la bague de membrane, ainsi que pour conserver une distance constante ou quasi constante entre la plaque de charge et la membrane en l'absence d'énergie sonore.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)