WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2014185562) LIGHT SCATTERING FILM FOR ORGANIC LIGHT EMITTING ELEMENT AND MANUFACTURING METHOD THEREFOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/185562    International Application No.:    PCT/KR2013/004234
Publication Date: 20.11.2014 International Filing Date: 13.05.2013
IPC:
H01L 51/52 (2006.01), H05B 33/22 (2006.01), H05B 33/10 (2006.01)
Applicants: ADVANCED NANO PRODUCTS CO., LTD. [KR/KR]; Buyong industrial complex, 244, Kumho-ri, Buyongmyeon Chungwon-kun Chungcheongbuk-do 336-942 (KR)
Inventors: SONG, Seho; (KR).
CHOI, Sungyul; (KR)
Agent: DANA PATENT LAW FIRM; 5th Floor, BYC Bldg., 648-1, Yeoksam-dong Gangnam-gu Seoul 135-080 (KR)
Priority Data:
10-2013-0053883 13.05.2013 KR
Title (EN) LIGHT SCATTERING FILM FOR ORGANIC LIGHT EMITTING ELEMENT AND MANUFACTURING METHOD THEREFOR
(FR) FILM DE DIFFUSION DE LUMIÈRE POUR ÉLÉMENT ÉLECTROLUMINESCENT ORGANIQUE ET SON PROCÉDÉ DE FABRICATION
(KO) 유기발광소자용 광산란막 및 그 제조방법
Abstract: front page image
(EN)Disclosed is a light scattering film comprising a scattering layer having pores formed therein and a flat layer formed on the scattering layer, wherein the pores formed in the scattering layer have an average pore diameter of 200nm to 1000nm.
(FR)L'invention concerne un film de diffusion de lumière comprenant une couche de diffusion dans laquelle sont formés des pores et une couche plate formée sur la couche de diffusion, les pores formés dans la couche de diffusion ayant un diamètre moyen compris entre 200 nm et 1000 nm.
(KO)본 발명은, 내부에 기공이 형성된 산란층과 상기 상란층 상에 형성된 평탄층을 포함하되, 상기 산란층 내에 형성된 기공의 평균 입경은 200nm 내지 1000nm인 광산란막을 개시한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)