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Machine translation
1. (WO2014185285) POLISHING COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/185285    International Application No.:    PCT/JP2014/062099
Publication Date: 20.11.2014 International Filing Date: 01.05.2014
IPC:
H01L 21/304 (2006.01), B24B 37/00 (2012.01), C09K 3/14 (2006.01)
Applicants: FUJIMI INCORPORATED [JP/JP]; 1-1, Chiryo 2-chome, Nishibiwajima-cho, Kiyosu-shi, Aichi 4528502 (JP)
Inventors: YOSHIZAKI, Yukinobu; (JP)
Agent: HATTA & ASSOCIATES; Dia Palace Nibancho, 11-9, Nibancho, Chiyoda-ku, Tokyo 1020084 (JP)
Priority Data:
2013-103244 15.05.2013 JP
Title (EN) POLISHING COMPOSITION
(FR) COMPOSITION DE POLISSAGE
(JA) 研磨用組成物
Abstract: front page image
(EN)The purpose of the present invention is to provide a means which is capable of improving the polishing rate and the polishing selectivity of a phase change compound. The present invention is a polishing composition which contains: an organic compound having three or more hydroxy groups; a brittle film-forming agent and/or an agent that exerts a chelating function on at least one component of a phase change compound; and an oxidant.
(FR)La présente invention concerne un moyen permettant d'améliorer la vitesse de polissage et la sélectivité du polissage d'un composé à changement de phase. La présente invention concerne une composition de polissage qui contient: un composé organique ayant au moins trois groupes hydroxy; un agent filmogène cassant et/ou un agent qui présente une fonction de chélation sur au moins un composant d'un composé à changement de phase; et un oxydant.
(JA) 本発明は、相変化化合物の研磨速度および研磨選択性を向上させうる手段を提供することを目的とする。 本発明は、3個以上のヒドロキシ基を有する有機化合物と、相変化化合物の少なくとも1つの成分に対してキレート作用を有する剤および脆性膜形成剤の少なくとも一方と、酸化剤と、を含む、研磨用組成物である。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)