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Machine translation
1. (WO2014182138) FILM PREPARATION CONTAINING DONEPEZIL-FREE BASE AND METHOD FOR PRODUCING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/182138    International Application No.:    PCT/KR2014/004218
Publication Date: 13.11.2014 International Filing Date: 12.05.2014
IPC:
A61K 9/70 (2006.01), A61K 31/445 (2006.01)
Applicants: CTC BIO, INC. [KR/KR]; 1F., 13, Jungdae-ro 40-gil, Songpa-gu, Seoul 138-858 (KR)
Inventors: JEON, Hong-Ryeol; (KR).
KWON, Do-Woo; (KR).
LEE, Bong-Sang; (KR).
PARK, Su-Jun; (KR).
CHA, Bong-Geun; (KR).
KIM, Jun-Ki; (KR).
HAN, Ji-Yeong; (KR).
KIL, Myeong-Cheol; (KR)
Agent: PHIL & ONZI INT'L PATENT & LAW FIRM; 8F., 63, Banpo-daero, Seocho-gu, Seoul 137-872 (KR)
Priority Data:
10-2013-0053355 10.05.2013 KR
Title (EN) FILM PREPARATION CONTAINING DONEPEZIL-FREE BASE AND METHOD FOR PRODUCING SAME
(FR) PRÉPARATION DE FILM CONTENANT UNE BASE EXEMPTE DE DONÉPÉZIL ET PROCÉDÉ DE PRODUCTION CORRESPONDANT
(KO) 도네페질 유리염기 함유 필름 제제 및 이의 제조 방법
Abstract: front page image
(EN)The present invention provides a method for producing a film which contains a tasteless donepezil-free base, has an appropriate size and thickness, has flexibility for providing stability when handled so as to not easily tear, and has a uniformly dispersed donepezil-free base. In addition, the present invention provides a film containing the donepezil-free base produced through the method.
(FR)L'invention concerne un procédé pour produire un film qui renferme une base exempte de donépézil insipide, présente des dimensions et une épaisseur adéquates, est souple et donc stable lorsqu'il est manipulé et ne se déchire pas facilement, ladite base exempte de donépézil étant dispersée uniformément. De plus, cette invention concerne un film renfermant la base exempte de donépézil produite au moyen dudit procédé.
(KO)본 발명은 무미의 도네페질 유리염기를 포함하면서도 적절한 크기와 두께를 가질 뿐만 아니라, 취급상 안정한 유연성(flexibility)을 가지고 잘 깨지지 않으며, 도네페질 유리염기가 균일하게 분산된 필름을 제조하는 방법을 제공한다. 본 발명은 또한 이러한 방법을 통해 제조된 도네페질 유리염기 함유 필름을 제공한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)