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1. (WO2014182095) ELECTRODE STRUCTURE INCLUDING INSULATION LAYER, METHOD FOR MANUFACTURING SAME, AND ELECTROCHEMICAL ELEMENT INCLUDING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/182095    International Application No.:    PCT/KR2014/004110
Publication Date: 13.11.2014 International Filing Date: 08.05.2014
IPC:
H01M 4/139 (2010.01), H01M 4/62 (2006.01), H01M 10/052 (2010.01)
Applicants: LG CHEM, LTD. [KR/KR]; 128, Yeoui-daero, Yeongdeungpo-gu, Seoul 150-721 (KR)
Inventors: YU, In-Gyoung; (KR).
KIM, Seok-Koo; (KR).
HONG, Jang-Hyuk; (KR).
JIN, Sun-Mi; (KR).
KIM, Jong-Hun; (KR)
Agent: PHIL & ONZI INT'L PATENT & LAW FIRM; 8F., 63, Banpo-daero, Seocho-gu, Seoul 137-872 (KR)
Priority Data:
10-2013-0052077 08.05.2013 KR
Title (EN) ELECTRODE STRUCTURE INCLUDING INSULATION LAYER, METHOD FOR MANUFACTURING SAME, AND ELECTROCHEMICAL ELEMENT INCLUDING SAME
(FR) STRUCTURE-ÉLECTRODE RECOUVERTE D'UNE COUCHE D'ISOLANT, SON PROCÉDÉ DE FABRICATION, ET ÉLÉMENT ÉLECTROCHIMIQUE CONTENANT LA STRUCTURE-ÉLECTRODE
(KO) 절연층을 포함한 전극 구조체, 그 제조방법 및 상기 전극을 포함하는 전기화학소자
Abstract: front page image
(EN)The present invention provides a method for manufacturing an electrode structure with an insulation layer formed thereon, which includes the steps of: (S1) drying a slurry for an electrode active material layer applied to an electrode collector placed on a heated base surface; (S2) drying a slurry consisting of inorganic particles, a binder and a solvent for an insulation layer applied to a heated roll positioned above the base surface with a given space between them; and (S3) transferring the dried slurry for the insulation layer to the dried slurry for the electrode active material layer on the base surface so as to heat-compress the dried slurry for the insulation layer and the dried slurry for the electrode active material layer. The method simplifies the process of forming an electrode, providing a porous structure formed with the electrode active material integrally connected with the insulation layer so as to make the insulation layer more closely contact the electrode active material, thus enhancing the structural stability.
(FR)L'invention concerne un procédé de fabrication d'une structure-électrode recouverte d'une couche d'isolant, ledit procédé consistant à : (S1) sécher une solution épaisse pour une couche de matière active d'électrode appliquée sur un collecteur d'électrode situé sur une surface de chauffée ; (S2) sécher une suspension épaisse constituée de particules inorganiques, d'un liant et d'un solvant pour une couche d'isolant appliquée sur un cylindre chauffé au-dessus de la surface de base, un espace vide étant situé entre les deux ; et (S3) transférer la suspension épaisse séchée pour la couche d'isolant sur la suspension épaisse séchée pour la couche de matière active d'électrode sur la surface de base de manière à comprimer par voie thermique la suspension épaisse séchée pour la couche d'isolant et la suspension épaisse séchée pour la couche de matière active d'électrode. Le procédé simplifie le processus de formation d'une électrode, produisant une structure poreuse formée avec la matière active d'électrode reliée intégralement à la couche d’isolant de manière à rapprocher la couche d'isolant de la matière active d'électrode, ce qui améliore la stabilité de la structure.
(KO)본 발명은 (S1) 전극 활물질층용 슬러리를 가열된 바닥면에 놓여진 전극 집전체 상에 도포 및 건조시키는 단계; (S2) 상기 바닥면과 소정의 간격을 갖도록 위치한 가열된 롤에 무기물 입자, 바인더 및 용매를 포함하는 절연층용 슬러리를 도포하여 건조시키는 단계; 및 (S3) 상기 건조된 절연층용 슬러리를 상기 바닥면 상의 건조된 전극 활물질층용 슬러리에 전사시켜 상기 건조된 절연층용 슬러리와 건조된 전극 활물질층용 슬러리를 열압착시키는 단계를 포함하여 제조되는 전극 표면에 절연층이 형성된 전극 구조체의 제조방법을 제공한다. 상기 제조방법은 전극의 형성 공정을 간략화 할 수 있으며, 전극 활물질과 절연층이 일체로 연결된 다공 구조가 형성되며, 전극 활물질층과 절연층의 더욱 잘 결착되어, 보다 더 강한 구조적 안정성을 가질 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)