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Machine translation
1. (WO2014182088) GAS SUPPLY DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/182088    International Application No.:    PCT/KR2014/004095
Publication Date: 13.11.2014 International Filing Date: 08.05.2014
IPC:
G02F 1/13 (2006.01), H01L 21/20 (2006.01)
Applicants: JUSUNG ENGINEERING CO., LTD. [KR/KR]; 240, Opo-ro, Opo-eup Gwangju-si Gyeonggi-do 464-892 (KR)
Inventors: HWANG, Chul Joo; (KR).
KANG, Ho Chul; (KR).
YANG, Seung Yong; (KR).
LEE, Myung Jin; (KR).
LEE, Yong Hyun; (KR).
CHONG, Cheol Woo; (KR).
CHOI, Jae Wook; (KR)
Agent: PARK, Young Bok; KPH & Associates 2nd Floor, Erum Bldg. 225-18, Pangyoyeok-ro Bundang-gu, Seongnam-si Gyeonggi-do 463-400 (KR)
Priority Data:
10-2013-0051652 08.05.2013 KR
Title (EN) GAS SUPPLY DEVICE
(FR) DISPOSITIF D'ALIMENTATION EN GAZ
(KO) 가스 공급 장치
Abstract: front page image
(EN)The present invention relates to a gas supply device and, more specifically, to a gas supply device which can improve the flow of process gas within a process chamber and can increase a degree of uniformity of a deposition layer. The gas supply device, according to the present invention, comprises: a lead having a gas pipe connected thereto; a first plate for discharging, to a process chamber, gas introduced into the lead; a second plate provided so as to disperse gas flowing towards the bottom by being arranged between the lead and the first plate; a plurality of discharge holes on the first plate; and a plurality of discharge holes formed on the second plate, wherein a discharge hole formed at a corner section of the second plate is arranged in a different state from that of a discharge hole of a corner section formed at the same position on the first plate.
(FR)La présente invention concerne un dispositif d'alimentation en gaz et, plus précisément, un dispositif d'alimentation en gaz susceptible d'améliorer la circulation d'un gaz de traitement dans une chambre de traitement et d'accroître un degré d'uniformité d'une couche de dépôt. Le dispositif d'alimentation en gaz d'après la présente invention comprend : un conduit auquel est raccordé un tuyau de gaz; une première plaque conçue pour décharger dans une chambre de traitement un gaz introduit dans le conduit; une seconde plaque montée de manière à disperser un gaz circulant vers le fond en étant agencée entre le conduit et la première plaque; une pluralité de trous de décharge formés sur la première plaque; et une pluralité de trous de décharge formés sur la seconde plaque. Un trou de décharge formé au niveau d'une section d'angle de la seconde plaque est agencé dans un état différent de celui d'un trou de décharge d'une section d'angle formé au niveau de la même position sur la première plaque.
(KO)본 발명은 가스 공급장치에 관한 것으로서, 상세하게는 공정 챔버 내의 공정 가스 흐름을 개선하고, 증착층의 균일도를 높일 수 있는 가스 공급장치에 관한 것이다. 이러한 본 발명은, 가스관이 연결되는 리드와; 상기 리드로 유입된 가스를 공정챔버로 배출하는 제1플레이트와; 상기 리드와 상기 제1플레이트 사이에 마련되어 하부로 향하는 가스를 분산시키도록 마련되는 제2 플레이트와, 상기 제1플레이트에 형성되는 복수의 배출홀과; 상기 제2플레이트에 형성되는 복수의 배출홀을 포함하되, 상기 제2플레이트의 코너부에 형성되는 배출홀은 상기 제1플레이트 상의 동일한 위치에 형성되는 코너부의 배출홀과 상이한 상태로 배치되는 것을 특징으로 하는 가스 공급 장치를 제공한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)