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1. (WO2014182049) METHOD FOR MANUFACTURING LIGHT ABSORPTION LAYER
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/182049    International Application No.:    PCT/KR2014/004023
Publication Date: 13.11.2014 International Filing Date: 07.05.2014
IPC:
H01L 31/0749 (2012.01), H01L 31/18 (2006.01)
Applicants: SK INNOVATION CO.,LTD. [KR/KR]; 26, Jong-ro Jongno-gu Seoul 110-728 (KR)
Inventors: KIM, Jin Hyock; (KR).
KIM, Hye Ri; (KR).
AN, Sung Jae; (KR).
KIM, Jin Woong; (KR)
Agent: PLUS INTERNATIONAL IP LAW FIRM; 10F, 809, Hanbat-daero Seo-gu Daejeon 35209 (KR)
Priority Data:
10-2013-0052800 10.05.2013 KR
Title (EN) METHOD FOR MANUFACTURING LIGHT ABSORPTION LAYER
(FR) PROCÉDÉ POUR FABRIQUER UNE COUCHE D'ABSOPRTION OPTIQUE
(KO) 광흡수층의 제조방법
Abstract: front page image
(EN)The present invention can provide a method for manufacturing a CIGS light absorption layer having an improved usage ratio of materials, improved productivity and excellent thin-film uniformity even in a wide area by depositing and annealing a precursor of a multi-layer structure by using a sputtering method in which a compound target of InxGaySez(IGS) and CuxSey (CS) are used.
(FR)L'invention concerne un procédé pour fabriquer une couche d'absorption optique CIGS ayant un rapport d'utilisation de matériaux amélioré, une productivité améliorée et une excellente uniformité du film mince même sur une grande surface par dépôt puis recuit d'un précurseur d'une structure multicouche au moyen d'un procédé de pulvérisation dans lequel une cible mixte de InxGaySez(IGS) et CuxSey (CS) est utilisée.
(KO)본 발명은 InxGaySez(IGS)와 CuxSey (CS)의 화합물 타겟을 이용하여 스퍼터링 방법으로 다층 구조의 전구체를 증착하고 열처리함으로써 재료 이용률 및 생산성 향상 및 대면적에서도 우수한 박막 균일도를 갖는 CIGS 광흡수층의 제조방법을 제공할 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)