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1. (WO2014181760) LIQUID FILTER SUBSTRATE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/181760    International Application No.:    PCT/JP2014/062124
Publication Date: 13.11.2014 International Filing Date: 02.05.2014
IPC:
B01D 71/26 (2006.01), B01D 69/02 (2006.01), C08J 9/00 (2006.01), C08J 9/26 (2006.01)
Applicants: TEIJIN LIMITED [JP/JP]; 6-7, Minamihommachi 1-chome, Chuo-ku, Osaka-shi Osaka 5410054 (JP)
Inventors: OHNO, Takao; (JP).
FURUYA, Kouji; (JP)
Agent: TAMEYAMA, Taro; c/o Teijin Limited, 2-1, Kasumigaseki 3-chome, Chiyoda-ku, Tokyo 1000013 (JP)
Priority Data:
2013-097629 07.05.2013 JP
2013-097630 07.05.2013 JP
2013-097635 07.05.2013 JP
Title (EN) LIQUID FILTER SUBSTRATE
(FR) MATÉRIAU DE BASE POUR FILTRE À LIQUIDE
(JA) 液体フィルター用基材
Abstract: front page image
(EN)This liquid filter substrate comprises a polyolefin microporous film, the water permeation performance of the polyolefin microporous film being 0.10-0.50 ml/min·cm2, and the bubble point of the polyolefin microporous film being 0.50-0.80 MPa inclusive.
(FR)L'invention concerne un matériau de base pour filtre à liquide qui est constitué par une membrane microporeuse en polyoléfine, laquelle membrane présente une perméabilité de 0,10 à 0,50ml/min.cm2, et un point de bulle supérieur ou égal à 0,50MPa, et inférieur ou égal à 0,80MPa.
(JA) ポリオレフィン微多孔膜からなり、前記ポリオレフィン微多孔膜の透水性能が0.10~0.50ml/min・cmであり、前記ポリオレフィン微多孔膜のバブルポイントが0.50MPa以上0.80MPa以下である、液体フィルター用基材。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)