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1. (WO2014180267) METHOD FOR FABRICATING HYDROPHOBIC COMPONENT, HYDROPHOBIC COMPONENT AND PHOTOVOLTAIC DEVICE CROSS-REFERENCE TO RELATED APPLICATIONS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/180267    International Application No.:    PCT/CN2014/076472
Publication Date: 13.11.2014 International Filing Date: 29.04.2014
IPC:
H01L 31/18 (2006.01), H01L 31/0216 (2014.01)
Applicants: SAINT-GOBAIN GLASS FRANCE [FR/FR]; 18 Avenue d' Alsace 92400 Courbevoie (FR) (For All Designated States Except US).
ZHANG, Shuai [CN/CN]; (CN) (US only).
DING, Jun [CN/CN]; (CN) (US only).
YUAN, Maowen [CN/CN]; (CN) (US only).
WANG, Zhengjia [CN/CN]; (CN) (US only)
Inventors: ZHANG, Shuai; (CN).
DING, Jun; (CN).
YUAN, Maowen; (CN).
WANG, Zhengjia; (CN)
Agent: UNITALEN ATTORNEYS AT LAW; 7th Floor, Scitech Place No.22, Jian Guo Men Wai Ave., Chao Yang District Beijing 100004 (CN)
Priority Data:
201310161755.5 06.05.2013 CN
Title (EN) METHOD FOR FABRICATING HYDROPHOBIC COMPONENT, HYDROPHOBIC COMPONENT AND PHOTOVOLTAIC DEVICE CROSS-REFERENCE TO RELATED APPLICATIONS
(FR) PROCÉDÉ DE FABRICATION DE CONSTITUANT HYDROPHOBE, CONSTITUANT HYDROPHOBE ET DISPOSITIF PHOTOVOLTAÏQUE
Abstract: front page image
(EN)A method for fabricating a hydrophobic component, a hydrophobic component and a photovoltaic device are provided. The method includes: providing a substrate (100); performing a plasma treatment on the substrate (100); and forming a low surface energy coating (200) on the substrate (100). The hydrophobic component is fabricated by the method. The photovoltaic device includes: a hydrophobic component fabricated by providing a transparent substrate (100), forming an anti-reflection coating (300) on the transparent substrate (100), performing a plasma treatment on the anti-reflection coating (300), and forming a low surface energy coating (200) on the anti-reflection coating (300); and a solar cell (400) disposed on a side of the transparent substrate (100) which does not have the anti-reflection coating (300) formed thereon. A contact angle of the low surface energy coating (200) may be increased and further the hydrophobicity of the hydrophobic component may be improved.
(FR)La présente invention concerne un procédé de fabrication d'un constituant hydrophobe, un constituant hydrophobe et un dispositif photovoltaïque. Le procédé comprend : l'utilisation d'un substrat (100) ; l'application d'un traitement au plasma au substrat (100) ; et la formation d'un revêtement à faible tension superficielle (200) sur le substrat (100). Le constituant hydrophobe est fabriqué selon le procédé. Le dispositif photovoltaïque comprend : un constituant hydrophobe fabriqué par la réalisation d'un substrat transparent (100), la formation d'un revêtement antireflet (300) sur le substrat transparent (100), l'application d'un traitement au plasma au revêtement antireflet (300), et la formation d'un revêtement à faible tension superficielle (200) sur le revêtement antireflet (300) ; et une cellule solaire (400) disposée d'un côté du substrat transparent (100) qui ne porte pas le revêtement antireflet (300). Un angle de contact du revêtement à faible tension superficielle (200) peut être augmenté et, en outre, l'hydrophobicité du constituant hydrophobe peut être améliorée.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)