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Machine translation
1. (WO2014179604) MASK
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/179604    International Application No.:    PCT/US2014/036418
Publication Date: 06.11.2014 International Filing Date: 01.05.2014
IPC:
A42B 3/06 (2006.01)
Applicants: F3 TECH, LLC [US/US]; 155 New Haven Avenue Derby, CT 06418 (US).
KLEIN, Jason [US/US]; (US).
ENGEL, Aaron [US/US]; (US) (US only)
Inventors: KLEIN, Jason; (US).
ENGEL, Aaron; (US)
Agent: CHILD, John; Paul & Paul 2000 Market Street, Suite 2900 Philadelphia, Pennsylvania 19103 (US)
Priority Data:
13/874,808 01.05.2013 US
Title (EN) MASK
(FR) MASQUE
Abstract: front page image
(EN)A shock absorber, for use with headgear having a faceguard, has a sliding member that does not extend beyond the support structure of the shock absorber in a way that would leave it vulnerable to damage. A headgear having a faceguard provides a protected mounting location for mounting a shock absorber for the faceguard.
(FR)L'invention porte sur un absorbeur de choc qui est destiné à être utilisé avec un masque ayant une protection pour visage, et lequel absorbeur a un élément coulissant qui ne s'étend pas au-delà de la structure de support de l'absorbeur de choc d'une façon qui le rendrait vulnérable aux détériorations. L'invention porte également sur un casque, qui a une protection pour visage, et qui procure un emplacement de montage protégé pour monter un absorbeur de choc du protection pour visage.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)