WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2014177255) REACTIVE SPUTTERING USING AN INTERMETALLIC OR CERAMIC TARGET
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/177255    International Application No.:    PCT/EP2014/001093
Publication Date: 06.11.2014 International Filing Date: 24.04.2014
IPC:
C23C 14/06 (2006.01), C23C 14/34 (2006.01), C23C 14/00 (2006.01)
Applicants: OERLIKON SURFACE SOLUTIONS AG, TRÜBBACH [CH/CH]; Hauptstrasse 53 CH-9477 Trübbach (CH)
Inventors: RACHBAUER, Richard; (AT).
ARNDT, Mirjam; (CH)
Agent: KEMPKENS, Anke; Kanzlei Kempkens Hofgraben 486 86899 Landsberg am Lech (DE)
Priority Data:
DE 10 2013 007 305.7 28.04.2013 DE
Title (DE) REAKTIVES SPUTTERN MIT INTERMETALLISCHEM ODER KERAMISCHEM TARGET
(EN) REACTIVE SPUTTERING USING AN INTERMETALLIC OR CERAMIC TARGET
(FR) PULVÉRISATION CATHODIQUE RÉACTIVE AVEC CIBLE INTERMÉTALLIQUE OU CÉRAMIQUE
Abstract: front page image
(DE)Die Erfindung betrifft ein Sputterverfahren zur Herstellung von Al-Cr-N Schichten, dadurch gekennzeichnet dass im für das Verfahren eingesetzten Target die Elemente nicht elementar sondern in einer Verbindung vorliegen.
(EN)The invention relates to a sputtering method for producing Al-Cr-N layers, characterized in that the elements in the target used in the method are not present in elemental form but in the form of a compound.
(FR)L'invention concerne un procédé de pulvérisation cathodique pour produire de couches Al-Cr-N. Ledit procédé est caractérisé en ce que dans la cible utilisée pour le procédé les éléments sont présents non pas sous forme élémentaires mais dans un composé.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: German (DE)
Filing Language: German (DE)