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1. (WO2014176877) ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE COMPRISING ARRAY SUBSTRATE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2014/176877    International Application No.:    PCT/CN2013/085511
Publication Date: 06.11.2014 International Filing Date: 18.10.2013
IPC:
H01L 29/786 (2006.01), H01L 27/12 (2006.01)
Applicants: BOE TECHNOLOGY GROUP CO., LTD. [CN/CN]; No.10 Jiuxianqiao Rd., Chaoyang District Beijing 100015 (CN)
Inventors: NING, Ce; (CN).
GAO, Tao; (CN)
Agent: LIU, SHEN & ASSOCIATES; 10th Floor, Building 1, 10 Caihefang Road, Haidian District Beijing 100080 (CN)
Priority Data:
201310155747.X 28.04.2013 CN
Title (EN) ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE COMPRISING ARRAY SUBSTRATE
(FR) SUBSTRAT DE MATRICE ET SON PROCÉDÉ DE FABRICATION, ET DISPOSITIF D'AFFICHAGE COMPRENANT LE SUBSTRAT DE MATRICE
(ZH) 阵列基板及其制作方法以及包括该阵列基板的显示装置
Abstract: front page image
(EN)The embodiments of the present invention provide an array substrate, comprising: an base substrate; an active layer and a first transparent electrode which are arranged on the base substrate; and an etching blocking layer which is arranged on the active layer and is used for protecting a part of the active layer, wherein the active layer, the first transparent electrode and the etching blocking layer are formed by using a single pattern composition process and a single doping process, and the doped region and the first transparent electrode have the same material and are located on the same layer.
(FR)Les modes de réalisation de la présente invention concernent un substrat de matrice comprenant : un substrat de base ; une couche active et une première électrode transparente qui sont agencées sur le substrat de base ; et une couche de blocage de gravure qui est agencée sur la couche active et sert à protéger une partie de la couche active, la couche active, la première électrode transparente et la couche de blocage de gravure étant formées au moyen d'un seul processus de composition de motif et d'un seul processus de dopage, et la zone dopée et la première électrode transparente ayant le même matériau et étant situées sur la même couche.
(ZH)本发明实施例提供了一种阵列基板包括:衬底基板;设置于所述衬底基板上的有源层和第一透明电极,设置在所述有源层上的刻蚀阻挡层,刻蚀阻挡层用于保护所述有源层的一部分,其中,采用一次构图工艺和一次掺杂工艺形成所述有源层、第一透明电极及所述刻蚀阻挡层,所述掺杂区域与所述第一透明电极的材料相同,并位于同一层上。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JP, KE, KG, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG).
Publication Language: Chinese (ZH)
Filing Language: Chinese (ZH)