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1. WO2014157171 - PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY DEVICE

Publication Number WO/2014/157171
Publication Date 02.10.2014
International Application No. PCT/JP2014/058230
International Filing Date 25.03.2014
IPC
G03F 7/039 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
C08F 20/26 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
10Esters
26Esters containing oxygen in addition to the carboxy oxygen
G03F 7/004 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/40 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
40Treatment after imagewise removal, e.g. baking
H01L 51/50 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
50specially adapted for light emission, e.g. organic light emitting diodes (OLED) or polymer light emitting devices (PLED)
H05B 33/22 2006.01
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
BELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR
33Electroluminescent light sources
12Light sources with substantially two-dimensional radiating surfaces
22characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
CPC
C08F 20/28
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
20Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
10Esters
26Esters containing oxygen in addition to the carboxy oxygen
28containing no aromatic rings in the alcohol moiety
G03F 7/0397
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
039Macromolecular compounds which are photodegradable, e.g. positive electron resists
0392the macromolecular compound being present in a chemically amplified positive photoresist composition
0397the macromolecular compound having an alicyclic moiety in a side chain
H01L 27/3258
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
28including components using organic materials as the active part, or using a combination of organic materials with other materials as the active part
32with components specially adapted for light emission, e.g. flat-panel displays using organic light-emitting diodes [OLED]
3241Matrix-type displays
3244Active matrix displays
3258Insulating layers formed between TFT elements and OLED elements
Applicants
  • 富士フイルム株式会社 FUJIFILM CORPORATION [JP]/[JP]
Inventors
  • 山田 悟 YAMADA Satoru
  • 松田 知樹 MATSUDA Tomoki
  • 霜山 達也 SHIMOYAMA Tatsuya
  • 山▲ざき▼ 健太 YAMAZAKI Kenta
Agents
  • 特許業務法人特許事務所サイクス SIKS & CO.
Priority Data
2013-06682727.03.2013JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY DEVICE
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE, PROCÉDÉ DE PRODUCTION DE FILM POLYMÉRISÉ, FILM POLYMÉRISÉ, DISPOSITIF D'AFFICHAGE À CRISTAUX LIQUIDES ET DISPOSITIF D'AFFICHAGE ÉLECTROLUMINESCENT ORGANIQUE
(JA) 感光性樹脂組成物、硬化膜の製造方法、硬化膜、液晶表示装置及び有機EL表示装置
Abstract
(EN)
Provided is a photosensitive resin composition which has achieved good chemical resistance and more decreased relative dielectric constant, while maintaining high sensitivity. This photosensitive resin composition contains: (A) a polymer component which contains a polymer satisfying (1) and/or (2) described below; (B) a photoacid generator; and (C) a solvent. (1) a polymer that has (a1) a constituent unit having a group wherein an acid group is protected by an acid-decomposable group and (a2) a constituent unit having a crosslinkable group (2) a polymer that has the constituent unit (a1) and a polymer that has the constituent unit (a2) In this connection, the polymer component (A) contains at least one constituent unit (a4) having a lactone structure, or alternatively, (3) the photosensitive resin composition contains at least one polymer that contains the constituent unit (a4) but does not contain the constituent unit (a1) and the constituent unit (a2).
(FR)
La présente invention concerne une composition de résine photosensible fournissant une bonne résistance chimique et une constante diélectrique relative plus basse tout en conservant une haute sensibilité. La composition de résine photosensible contient : (A) un constituant polymère qui contient un polymère qui satisfait à (1) et/ou à (2) décrits ci-dessous ; (B) un générateur de photoacide ; et (C) un solvant. (1) un polymère qui comprend (a1) une unité constituante possédant un groupe dans lequel un groupe acide est protégé par un groupe décomposable à l'acide et (a2) une unité constituante possédant un groupe réticulable ; (2) un polymère comprenant l'unité constituante (a1) et un polymère comprenant l'unité constituante (a2). À cet égard, le composant polymère (A) contient au moins une unité constituante (a4) ayant une structure de lactone ou, comme variante, (3) la composition de résine photosensible contient au moins un polymère qui possède l'unité constituante (a4) mais ne possède pas l'unité constituante (a1) ni l'unité constituante (a2).
(JA)
高い感度を維持しつつ、耐薬品性を良好にし、かつ比誘電率をより低くすることができる感光性樹脂組成物を提供する。(A)下記(1)及び(2)の少なくとも一方を満たす重合体を含む重合体成分、(1)(a1)酸基が酸分解性基で保護された基を有する構成単位、及び(a2)架橋性基を有する構成単位を有する重合体、又は(2)前記構成単位(a1)を有する重合体及び前記構成単位(a2)を有する重合体、(B)光酸発生剤、(C)溶剤を含有し、前記(A)重合体成分中に、(a4)ラクトン構造を有する構成単位が少なくとも1種含まれているか、 (3)前記構成単位(a4)を含み、かつ、前記構成単位(a1)及び前記構成単位(a2)を含まない重合体を少なくとも1種含む感光性樹脂組成物。
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