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1. WO2014129488 - HIGH-PURITY 1H-HEPTAFLUOROCYCLOPENTENE

Publication Number WO/2014/129488
Publication Date 28.08.2014
International Application No. PCT/JP2014/053863
International Filing Date 19.02.2014
IPC
C07C 23/08 2006.1
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
23Compounds containing at least one halogen atom bound to a ring other than a six-membered aromatic ring
02Monocyclic halogenated hydrocarbons
08with a five-membered ring
C07C 17/354 2006.1
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
17Preparation of halogenated hydrocarbons
35by reactions not affecting the number of carbon or halogen atoms in the molecules
354by hydrogenation
C07C 17/383 2006.1
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
17Preparation of halogenated hydrocarbons
38Separation; Purification; Stabilisation; Use of additives
383by distillation
H01L 21/3065 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
04the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18the devices having semiconductor bodies comprising elements of group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20-H01L21/26142
302to change the physical characteristics of their surfaces, or to change their shape, e.g. etching, polishing, cutting
306Chemical or electrical treatment, e.g. electrolytic etching
3065Plasma etching; Reactive-ion etching
C07B 61/00 2006.1
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
BGENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
61Other general methods
CPC
B65D 25/38
BPERFORMING OPERATIONS; TRANSPORTING
65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
25Details of other kinds or types of rigid or semi-rigid containers
38Devices for discharging contents
C07C 17/23
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
17Preparation of halogenated hydrocarbons
23by dehalogenation
C07C 17/383
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
17Preparation of halogenated hydrocarbons
38Separation; Purification; Stabilisation; Use of additives
383by distillation
C07C 23/08
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
23Compounds containing at least one halogen atom bound to a ring other than a six-membered aromatic ring
02Monocyclic halogenated hydrocarbons
08with a five-membered ring
C07C 2601/10
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
CACYCLIC OR CARBOCYCLIC COMPOUNDS
2601Systems containing only non-condensed rings
06with a five-membered ring
10the ring being unsaturated
C09K 13/00
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
13Etching, surface-brightening or pickling compositions
Applicants
  • 日本ゼオン株式会社 ZEON CORPORATION [JP]/[JP]
Inventors
  • 杉本 達也 SUGIMOTO Tatsuya
Agents
  • 大石 治仁 OHISHI Haruhito
Priority Data
2013-03159921.02.2013JP
Publication Language Japanese (ja)
Filing Language Japanese (JA)
Designated States
Title
(EN) HIGH-PURITY 1H-HEPTAFLUOROCYCLOPENTENE
(FR) 1H-HEPTAFLUOROCYCLOPENTÈNE À PURETÉ ÉLEVÉE
(JA) 高純度1H-ヘプタフルオロシクロペンテン
Abstract
(EN)  The present invention is a 1H-heptafluorocyclopentene characterized in having a purity of 99.9 wt% or greater and an organochlorine compound content of 350 wt ppm or less. The present invention provides a high-purity 1H-heptafluorocyclopentene that can be used as a gas in plasma reactions for semiconductors.
(FR) La présente invention concerne un 1H-heptafluorocyclopentène caractérisé en ce qu'il a une pureté de 99,9 % en poids ou plus et une teneur en composé organochlore de 350 ppm en poids ou moins. La présente invention concerne un 1H-heptafluorocyclopentène à pureté élevée qui peut être utilisé comme gaz dans des réactions plasma pour des semi-conducteurs.
(JA)  本発明は、純度99.9重量%以上で、且つ、有機塩素系化合物の含有量が350重量ppm以下であることを特徴とする1H-ヘプタフルオロシクロペンテンである。 本発明によれば、半導体向けのプラズマ反応用ガスとして好適な高純度の1H-ヘプタフルオロシクロペンテンが提供される。
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