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1. WO2014111503 - BLOCK COPOLYMERS HAVING A POLYDIMETHYLSILOXANE BLOCK

Publication Number WO/2014/111503
Publication Date 24.07.2014
International Application No. PCT/EP2014/050874
International Filing Date 17.01.2014
IPC
C08G 77/442 2006.1
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
77Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon
42Block- or graft-polymers containing polysiloxane sequences
442containing vinyl polymer sequences
C08J 3/20 2006.1
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
3Processes of treating or compounding macromolecular substances
20Compounding polymers with additives, e.g. colouring
C08L 83/10 2006.1
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
83Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Compositions of derivatives of such polymers
10Block- or graft-copolymers containing polysiloxane sequences
CPC
C08G 77/442
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
77Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
42Block-or graft-polymers containing polysiloxane sequences
442containing vinyl polymer sequences
C08G 81/024
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
81Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers
02at least one of the polymers being obtained by reactions involving only carbon-to-carbon unsaturated bonds
024Block or graft polymers containing sequences of polymers of C08C or C08F and of polymers of C08G
C08L 51/085
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
51Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds
08grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
085on to polysiloxanes
C08L 53/00
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
53Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
C08L 83/10
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
83Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
10Block- or graft-copolymers containing polysiloxane sequences
C09D 151/085
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
151Coating compositions based on graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds
08grafted on to macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
085on to polysiloxanes
Applicants
  • BASF SE [DE]/[DE]
Inventors
  • ENGELBRECHT, Lothar
  • PIRRUNG, Frank
  • AUSCHRA, Clemens
  • KNISCHKA, Ralf
  • KRANWETVOGEL, Reiner
Agents
  • REITSTÖTTER - KINZEBACH
Priority Data
13151902.718.01.2013EP
Publication Language German (de)
Filing Language German (DE)
Designated States
Title
(DE) BLOCK-COPOLYMERE MIT EINEM POLYDIMETHYLSILOXAN-BLOCK
(EN) BLOCK COPOLYMERS HAVING A POLYDIMETHYLSILOXANE BLOCK
(FR) COPOLYMÈRES SÉQUENCÉS POURVUS D'UNE SÉQUENCE POLYDIMÉTHYLSILOXANE
Abstract
(DE) Die vorliegende Erfindung betrifft neue Block-Copolymere der allgemeinen Formel (I). Die Erfindung betrifft auch ein Verfahren zur Herstellung derartiger Blockcopolymere und deren Verwendung, insbesondere als Additive in flüssigen Beschichtungsmittelzusammensetzungen. A{X-[O-C(O)NH-Y-NH-C(O)-O-M-B]k}n (I). In Formel (I) haben die Variablen die folgenden Bedeutungen: n steht für eine Zahl im Bereich von 1 bis 40 oder 2 bis 40, insbesondere 1 bis 10 oder 2 bis 10 und speziell für 2 bis 5; k steht für 1 oder 2; A steht für einen Poly(dimethylsiloxan)-Block; B steht für einen aus ethylenisch ungesättigten Monomeren aufgebauten Polymerblock, der gegebenenfalls eine von Wasserstoff verschiedene Endgruppe aufweist; X steht für einen bivalenten oder trivalenten Rest mit 2 bis 20 C-Atomen, der gesättigt oder ungesättigt ist und der gegebenenfalls 1, 2, 3 oder 4 Substituenten trägt, die unter OH, COOH, CONH2, C1-C4-Alkoxy, C1-C4-Alkoxycarbonylund Halogen ausgewählt sind; Y steht für einen bivalenten Kohlenwasserstoffrest mit 2 bis 20 C-Atomen, der gesättigt oder ungesättigt ist, und M steht für eine chemische Bindung oder C2-C10-Alkylen, das durch ein oder zwei nicht unmittelbar benachbarte Gruppen, ausgewählt unter O, C(=O)O und (C=O)NH unterbrochen sein kann und das gegebenenfalls 1, 2, 3 oder 4 Substituenten trägt, die unter OH, COOH, CONH2, C1-C4-Alkoxy, C1-C4-Alkoxycarbonyl und Phenyl ausgewählt sind.
(EN) The present invention relates to novel block copolymers of general formula (I). The invention further relates to a method for producing such block copolymers and to the use of such block copolymers, particularly as additives in liquid coating-agent compositions. A{X-[O-C(O)NH-Y-NH-C(O)-O-M-B]k}n (I). In formula (I), the variables have the following meanings: n is a number in the range from 1 to 40 or 2 to 40, particularly 1 to 10 or 2 to 10 and especially 2 to 5; k is 1 or 2; A is a poly(dimethylsiloxane) block; B is a polymer block constructed of ethylenically unsaturated monomers, which optionally comprises a terminal group different from hydrogen; X is a bivalent or trivalent group having 2 to 20 C atoms, which is saturated or unsaturated and which optionally bears 1, 2, 3, or 4 substituents selected from among OH, COOH, CONH2, C1-C4 alkoxy, C1-C4 alkoxycarbonyl, and halogen; Y is a bivalent hydrocarbon group having 2 to 20 C atoms, which is saturated or unsaturated, and M is a chemical bond or C2-C10 alkylene, which can be interrupted by one or two groups not directly adjacent, selected from among O, C(=O)O, and (C=O)NH and which optionally bears 1, 2, 3, or 4 substituents selected from among OH, COOH, CONH2, C1-C4 alkoxy, C1-C4 alkoxycarbonyl, and phenyl.
(FR) La présente invention concerne de nouveaux copolymères séquencés de formule générale (I). Elle concerne également un procédé de production desdits copolymères séquencés et leur utilisation, en particulier en tant qu'additifs dans des compositions de revêtement liquides. La formule générale (I) correspond à la formule suivante : A{X-[O-C(O)NH-Y-NH-C(O)-O-M-B]k}n. Dans la formule (I), les variables ont les significations suivantes : n représente un nombre allant de 1 à 40 ou de 2 à 40, en particulier de 1 à 10 ou de 2 à 10, et spécialement de 2 à 5; k représente 1 ou 2; A représente une séquence poly(diméthylsiloxane); B représente une séquence polymère constituée de monomères éthyléniquement insaturés, comportant éventuellement un groupe terminal différent de l'hydrogène; X représente un radical divalent ou trivalent ayant 2 à 20 atomes de C, saturé ou insaturé, qui porte éventuellement 1, 2, 3 ou 4 substituants choisis parmi OH, COOH, CONH2, alcoxy C1-C4, alcoxycarbonyle C1-C4 et halogène; Y représente un radical hydrocarbure divalent ayant 2 à 20 atomes de C, saturé ou insaturé, et M représente une liaison chimique ou alkylène C2-C10 qui peut être interrompu par un ou deux groupes non immédiatement voisins, choisis parmi O, C(=O)O et (C=O)NH et qui porte éventuellement 1, 2, 3 ou 4 substituants choisis parmi OH, COOH, CONH2, alcoxy C1-C4, alcoxycarbonyle C1-C4 et phényle.
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