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1. (WO2013163079) FACEPLATE HAVING REGIONS OF DIFFERING EMISSIVITY

Pub. No.:    WO/2013/163079    International Application No.:    PCT/US2013/037583
Publication Date: Fri Nov 01 00:59:59 CET 2013 International Filing Date: Tue Apr 23 01:59:59 CEST 2013
IPC: H01L 21/205
Applicants: APPLIED MATERIALS, INC.
Inventors: WILSON, James K.
HATHCOCK, William A.
LEE, David R.
Title: FACEPLATE HAVING REGIONS OF DIFFERING EMISSIVITY
Abstract:
Gas distribution apparatus for use in substrate processing chambers are disclosed. In some embodiments, gas distribution apparatus may include a faceplate to distribute a gas to a substrate. The faceplate includes a first side that faces the substrate. A central region of the first side has a first surface finish and a peripheral region of the first side has a second surface finish different than the first. A plurality of gas distribution holes are disposed through the faceplate to allow the gas to pass through the faceplate to a volume disposed on the first side of the faceplate. A rabbet may be disposed along an outer periphery of the faceplate on the first side with a ring disposed in the rabbet and removably coupled to the faceplate to form the peripheral region. The ring has a second side having the second surface finish that faces the substrate during use.