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1. (WO2013162825) PLASMA PROCESSING USING RF RETURN PATH VARIABLE IMPEDANCE CONTROLLER WITH TWO-DIMENSIONAL TUNING SPACE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/162825 International Application No.: PCT/US2013/034568
Publication Date: 31.10.2013 International Filing Date: 29.03.2013
IPC:
H05H 1/46 (2006.01) ,H03H 7/40 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
46
using applied electromagnetic fields, e.g. high frequency or microwave energy
H ELECTRICITY
03
BASIC ELECTRONIC CIRCUITRY
H
IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
7
Multiple-port networks comprising only passive electrical elements as network components
38
Impedance-matching networks
40
Automatic matching of load impedance to source impedance
Applicants:
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, CA 95054, US
Inventors:
MISRA, Nipun; US
RAMASWAMY, Kartik; US
YANG, Yang; US
BUCHBERGER, Douglas, A.; US
CARDUCCI, James, D.; US
WONG, Lawrence; US
NEVIL, Shane, C.; US
RAUF, Shahid; US
COLLINS, Kenneth, S.; US
Agent:
WALLACE, Robert, M.; Law Offices Of Robert M. Wallace 2112 Eastman Avenue, Suite 102 Ventura, CA 93003, US
Priority Data:
13/842,28715.03.2013US
61/637,55824.04.2012US
Title (EN) PLASMA PROCESSING USING RF RETURN PATH VARIABLE IMPEDANCE CONTROLLER WITH TWO-DIMENSIONAL TUNING SPACE
(FR) TRAITEMENT PAR PLASMA UTILISANT UNE COMMANDE À IMPÉDANCE VARIABLE D'UN TRAJET DE RETOUR RF AVEC ESPACE D'ACCORD BIDIMENSIONNEL
Abstract:
(EN) In a plasma reactor having a driven electrode and a counter electrode, an impedance controller connected between the counter- electrode and ground includes both series sand parallel variable impedance elements that facilitate two-dimensional movement of a ground path input impedance in a complex impedance space to control spatial distribution of a plasma process parameter.
(FR) L'invention concerne un réacteur à plasma doté d'une électrode pilotée et d'une contre-électrode, caractérisé en ce qu'une commande d'impédance branchée entre la contre-électrode et la terre comprend à la fois des éléments à impédance variable en série et en parallèle qui facilitent un mouvement bidimensionnel d'une impédance d'entrée de trajet de retour à la terre dans un espace d'impédance complexe afin de commander la répartition spatiale d'un paramètre de processus à plasma.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)