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1. (WO2013162792) ELECTROSTATIC CHUCK HAVING REDUCED POWER LOSS
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Claims:

1 . An electrostatic chuck, comprising:

a conductive base; and

a ceramic body disposed on the conductive base, the ceramic body comprising an electrode embedded therein, wherein the ceramic body comprises a dissipation factor of about 0.1 1 to about 0.16.

2. The electrostatic chuck of claim 1 , wherein the ceramic body comprises one or more heating elements embedded therein.

3. The electrostatic chuck of claim 2, wherein the ceramic body comprises a capacitance of about 750 picoFarads to about 950 picoFarads between the electrode and the one or more heating elements.

4. The electrostatic chuck of claim 1 , wherein the ceramic body comprises an outer heating element and an inner heating element.

5. The electrostatic chuck of claim 4, wherein the ceramic body comprises a capacitance of about 750 picoFarads to about 950 picoFarads between the electrode and the inner and outer heating elements.

6 The electrostatic chuck of claim 1 , wherein the ceramic body further comprises a top dielectric thickness of about 0.041 inches to about 0.044 inches between a surface of the electrode and a surface of the ceramic body.

7. The electrostatic chuck of claim 6, wherein the ceramic body comprises one or more heating elements embedded therein.

8. The electrostatic chuck of claim 7, wherein the ceramic body comprises a capacitance of about 750 picoFarads to about 950 picoFarads between the electrode and the one or more heating elements.

9. A plasma reactor, comprising:

a vacuum chamber;

an electrostatic chuck within the chamber for supporting a substrate to be processed, and

a radio frequency supply voltage source coupled to an electrode disposed within the electrostatic chuck, wherein the electrostatic chuck comprises:

a ceramic body coupled to a conductive base, the ceramic body comprising a ceramic material having the electrode embedded therein, wherein the ceramic material includes a dissipation factor of about 0.1 1 to about 0.16.

10. The plasma reactor of claim 9, wherein the electrostatic chuck further comprises one or more heating elements embedded in the ceramic body.

1 1 . The plasma reactor of claim 10, wherein the ceramic material comprises a capacitance of about 750 picoFarads to about 950 picoFarads between the electrode and the one or more heating elements.

12. The plasma reactor of claim 9, wherein the ceramic body comprises an outer heating element and an inner heating element.

13. The plasma reactor of claim 12, wherein the ceramic body comprises a capacitance of about 750 picoFarads to about 950 picoFarads between the electrode and the inner and outer heating elements.

14 The plasma reactor of claim 9, wherein the ceramic body further comprises a top dielectric thickness of about 0.041 inches to about 0.044 inches between a surface of the electrode and a surface of the ceramic body.

15. The plasma reactor of claim 14, wherein the ceramic body comprises one or more heating elements embedded therein.

16. The electrostatic chuck of claim 15, wherein the ceramic body comprises a capacitance of about 750 picoFarads to about 950 picoFarads between the electrode and the one or more heating elements.