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1. WO2013161872 - NOVOLAC-TYPE PHENOLIC RESIN AND METHOD FOR PRODUCING SAME, AND PHOTORESIST COMPOSITION

Publication Number WO/2013/161872
Publication Date 31.10.2013
International Application No. PCT/JP2013/062050
International Filing Date 24.04.2013
IPC
C08G 8/04 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
8Condensation polymers of aldehydes or ketones with phenols only
04of aldehydes
CPC
C08G 8/24
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
8Condensation polymers of aldehydes or ketones with phenols only
04of aldehydes
08of formaldehyde, e.g. of formaldehyde formed in situ
24with mixtures of two or more phenols which are not covered by only one of the groups C08G8/10 - C08G8/20
C09D 161/06
CCHEMISTRY; METALLURGY
09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
161Coating compositions based on condensation polymers of aldehydes or ketones
04Condensation polymers of aldehydes or ketones with phenols only
06of aldehydes with phenols
G03F 7/0236
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
022Quinonediazides
023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
0233characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
0236Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Applicants
  • 明和化成株式会社 MEIWA PLASTIC INDUSTRIES, LTD. [JP]/[JP]
Inventors
  • 黒岩 貞昭 KUROIWA, Sadaaki
  • 古本 貴久 FURUMOTO, Takahisa
Agents
  • 伊丹 勝 ITAMI, Masaru
Priority Data
2012-09872724.04.2012JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) NOVOLAC-TYPE PHENOLIC RESIN AND METHOD FOR PRODUCING SAME, AND PHOTORESIST COMPOSITION
(FR) RÉSINE PHÉNOLIQUE NOVOLAQUE, PROCÉDÉ DE FABRICATION DE CELLE-CI, ET COMPOSITION PHOTOSENSIBLE
(JA) ノボラック型フェノール樹脂、その製造方法及びフォトレジスト組成物
Abstract
(EN)
The purpose of the present invention is to propose: a novolac-type phenolic resin which enables the provision of a practically useful photoresist composition having a good balance among high heat resistance, high sensitivity, a high residual film ratio, a high resolution and etching resistance; a method for producing the novolac-type phenolic resin; and a photoresist composition containing the novolac-type phenolic resin. The present invention relates to a novolac-type phenolic resin produced by the polycondensation reaction of a phenol component (a) with an aldehyde component (b), said novolac-type phenolic resin being characterized in that the phenol component (a) comprises an alkyl phenol (a1) containing m-cresol and p-cresol as essential components and phenol (a2), the aldehyde component (b) comprises an aliphatic polyaldehyde (b1) and formaldehyde (b2), and the weight average molecular weight of the novolac-type phenolic resin is 4000 or more.
(FR)
L'invention a pour objectif d'obtenir une résine phénolique novolaque permettant d'obtenir une composition photosensible adaptée présentant un bon équilibre entre une haute résistance à la chaleur, une haute sensibilité, un haut taux de film résiduel, une haute résolution et une résistance à la gravure, l'invention a également pour objectif d'obtenir un procédé de fabrication de ladite résine phénolique novolaque, et une composition photosensible comprenant ladite résine phénolique novolaque. Cette résine phénolique novolaque est caractéristique en ce qu'elle est obtenue en effectuant une polymérisation par condensation d'un composant phénol (a) et d'un composant aldéhyde (b). Le composant phénol (a) est constitué par des alklphénols (a1) ayant pour composants essentiels un m-crésol et un p-crésol, et par un phénol (a2). Le composant aldéhyde (b) est constitué par un polyaldéhyde aliphatique (b1) et un formaldéhyde (b2). La masse moléculaire en poids de la résine phénolique novolaque, est supérieure ou égale à 400.
(JA)
 本発明の目的は、高耐熱、高感度、高残膜率、高解像度、及び耐エッチング性をバランスよく有する実用的なフォトレジスト組成物の提供を可能にするノボラック型フェノール樹脂及びその製造方法、並びに当該ノボラック型フェノール樹脂を含有するフォトレジスト組成物を提案することにある。 フェノール成分(a)とアルデヒド成分(b)とを縮重合反応して得られるノボラック型フェノール樹脂であって、フェノール成分(a)がm-クレゾールとp-クレゾールとを必須成分とするアルキルフェノール類(a1)とフェノール(a2)とからなり、アルデヒド成分(b)が脂肪族ポリアルデヒド(b1)とホルムアルデヒド(b2)とからなり、重量平均分子量が4000以上であることを特徴とするノボラック型フェノール樹脂に関する。
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