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1. (WO2013161827) METHOD FOR PRODUCING GLASS SUBSTRATE WITH SILICON OXIDE FILM CONTAINING INORGANIC FINE PARTICLES

Pub. No.:    WO/2013/161827    International Application No.:    PCT/JP2013/061947
Publication Date: Fri Nov 01 00:59:59 CET 2013 International Filing Date: Wed Apr 24 01:59:59 CEST 2013
IPC: C03C 17/25
C03C 17/34
H01L 31/04
H01L 51/50
H05B 33/02
G02B 5/02
Applicants: ASAHI GLASS COMPANY, LIMITED
旭硝子株式会社
Inventors: KUWAHARA, Yuichi
▲桑▼原 雄一
MORI, Yusuke
森 勇介
ABE, Keisuke
阿部 啓介
YONEDA, Takashige
米田 貴重
Title: METHOD FOR PRODUCING GLASS SUBSTRATE WITH SILICON OXIDE FILM CONTAINING INORGANIC FINE PARTICLES
Abstract:
Provided is a method for producing a glass substrate with a silicon oxide film containing inorganic fine particles, wherein inorganic fine particles having a desired particle diameter can be used in accordance with objective optical characteristics and there is a wide range of choices for inorganic fine particles. A silicon oxide film (12) containing inorganic fine particles is formed by applying a coating liquid onto a glass substrate (10), said coating liquid containing inorganic fine particles (14), a hydrolysis product of an alkoxysilane, and water and/or a (poly)ethylene glycol; or alternatively, a silicon oxide film containing inorganic fine particles is formed by applying a coating liquid onto a glass ribbon when a glass substrate is produced by molding molten glass into the glass ribbon and slowly cooling and then cutting the glass ribbon, said coating liquid containing inorganic fine particles, a hydrolysis product of an alkoxysilane, and water and/or a (poly)ethylene glycol.