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1. (WO2013161735) COMPOSITION FOR PRODUCING COMPOUND OXIDE THIN FILM, METHOD FOR PRODUCING THIN FILM USING COMPOSITION, AND COMPOUND OXIDE THIN FILM

Pub. No.:    WO/2013/161735    International Application No.:    PCT/JP2013/061729
Publication Date: Fri Nov 01 00:59:59 CET 2013 International Filing Date: Tue Apr 23 01:59:59 CEST 2013
IPC: C01G 19/00
C01G 25/00
Applicants: TOSOH FINECHEM CORPORATION
東ソー・ファインケム株式会社
Inventors: TAKEMOTO, Yujin
竹元 裕仁
HAGA, Kenichi
羽賀 健一
INABA, Koichiro
稲葉 孝一郎
TOYOTA, Kouji
豊田 浩司
TOKUDOME, Kouichi
徳留 功一
YOSHINO, Kenji
吉野 賢二
OSHIMA, Minoru
小嶋 稔
Title: COMPOSITION FOR PRODUCING COMPOUND OXIDE THIN FILM, METHOD FOR PRODUCING THIN FILM USING COMPOSITION, AND COMPOUND OXIDE THIN FILM
Abstract:
Provided are a composition with which a compound oxide thin film that can be used for an oxide semiconductor film, and the like can be formed by spray pyrolysis, and the like, and a method for forming a compound oxide thin film using the composition. The present invention relates to a composition for producing a compound oxide comprising at least one compound selected from the group consisting of compounds containing elemental zinc and compounds containing group 3B elements, the product of partial hydrolysis by water of the above-mentioned compound, or the above-mentioned compound and the above-mentioned partial hydrolysis product, as well as at least one compound selected from the group consisting of compounds containing group 4A elements and compounds containing group 4B elements, the product of partial hydrolysis by water of the above-mentioned compound, or the above-mentioned compound and the above-mentioned partial hydrolysis product. The present invention relates to a method for producing a compound oxide thin film having an average permeability of 80% or more by visible light rays, which comprises performing at least once a step for coating a substrate surface with the composition under an inert gas atmosphere and then heating the resulting coating film.