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1. (WO2013161630) IMPRINT MATERIAL HAVING LOW MOLD RELEASE STRENGTH

Pub. No.:    WO/2013/161630    International Application No.:    PCT/JP2013/061291
Publication Date: Fri Nov 01 00:59:59 CET 2013 International Filing Date: Wed Apr 17 01:59:59 CEST 2013
IPC: H01L 21/027
B29C 59/02
C08F 16/26
C08F 20/28
Applicants: NISSAN CHEMICAL INDUSTRIES, LTD.
日産化学工業株式会社
Inventors: KOBAYASHI, Junpei
小林 淳平
KATO, Taku
加藤 拓
SHUTO, Keisuke
首藤 圭介
SUZUKI, Masayoshi
鈴木 正睦
Title: IMPRINT MATERIAL HAVING LOW MOLD RELEASE STRENGTH
Abstract:
[Problem] To provide: an imprint material which enables a resin film to be easily released from a mold during the mold releasing after curing, namely an imprint material which forms a film that has low mold release strength, high transparency, high abrasion resistance and high fingerprint wiping-off properties; and a film which is formed from the imprint material and to which a pattern is transferred. [Solution] An imprint material which contains: a compound which has two polymerizable groups and a propylene oxide unit or a propylene oxide unit and an ethylene oxide unit (component (A)); a silicone compound (component (B)); and a photopolymerization initiator (component (C)).