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1. (WO2013160428) METHOD FOR TREATING AT LEAST ONE SUBSTRATE IN A LIQUID MEDIUM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/160428    International Application No.:    PCT/EP2013/058687
Publication Date: 31.10.2013 International Filing Date: 26.04.2013
Chapter 2 Demand Filed:    27.02.2014    
IPC:
H01L 21/67 (2006.01)
Applicants: AWT ADVANCED WET TECHNOLOGIES GMBH [DE/DE]; Römerstrasse 39 78183 Hüfingen (DE)
Inventors: HAUGER, Hans; (DE).
SCHULZ, Werner; (DE)
Agent: DRES. WEISS & ARAT; Zeppelinstrasse 4 78234 Engen (DE)
Priority Data:
10 2012 103 762.0  27.04.2012 DE
10 2013 102 545.5 13.03.2013 DE
Title (DE) VERFAHREN ZUM BEHANDELN VON ZUMINDEST EINEM SUBSTRAT IN EINEM FLÜSSIGEN MEDIUM
(EN) METHOD FOR TREATING AT LEAST ONE SUBSTRATE IN A LIQUID MEDIUM
(FR) PROCÉDÉ DE TRAITEMENT D'AU MOINS UN SUBSTRAT DANS UN MILIEU LIQUIDE
Abstract: front page image
(DE)Bei einem Verfahren zum Behandeln von zumindest einem Substrat (15), insbesondere von Wafern, in einem flüssigen Medium (3), wird in einem ersten Schritt das Substrats (15) in dem flüssigen Medium (3) angehoben, bis das Substrat (15) zumindest teilweise aus dem flüssigen Medium (3) ausgehoben ist, und in einem zweiten Schritt an zumindest einer aus dem flüssigen Medium (3) herausragenden Stelle übernommen.
(EN)The invention relates to a method for treating at least one substrate (15), particularly wafers, in a liquid medium (3). In a first step, the substrate (15) is lifted in the liquid medium (3) until said substrate (15) is at least partially lifted out of the liquid medium (3) and, in a second step, is passed on at at least one point protruding out of said liquid medium (3).
(FR)L'invention concerne un procédé de traitement d'au moins un substrat (15), en particulier de tranches de semi-conducteurs, dans un milieu liquide (3). Dans une première étape, le substrat (15) est remonté dans le milieu liquide (3) jusqu'à ce que le substrat (15) sorte au moins en partie du milieu liquide (3) et, dans une deuxième étape, il est saisi à au moins un endroit qui dépasse du milieu liquide (3).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: German (DE)
Filing Language: German (DE)