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1. (WO2013160083) CONTAMINATION TRAP FOR A LITHOGRAPHIC APPARATUS

Pub. No.:    WO/2013/160083    International Application No.:    PCT/EP2013/057169
Publication Date: Fri Nov 01 00:59:59 CET 2013 International Filing Date: Sat Apr 06 01:59:59 CEST 2013
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: LUIJTEN, Carlo
Title: CONTAMINATION TRAP FOR A LITHOGRAPHIC APPARATUS
Abstract:
Disclosed is a contamination trap arrangement (300) configured to trap debris particles that are generated with the formation of a plasma within a radiation source configured to generate extreme ultraviolet radiation. The contamination trap comprises a vane structure (310) for trapping the debris particles; a heating arrangement (330) for heating the vane structure, the heating arrangement being in thermal communication with the vane structure; a cooling arrangement (350) for transporting heat generated as a result of the plasma formation, away from the vane structure, and a gap (370) between the heating arrangement and the cooling arrangement. The cooling arrangement is in thermal communication with the vane structure via the heating arrangement and the gap and the contamination trap also comprises a heat transfer adjustment arrangement operable to adjust the heat transfer characteristics of a fluid inside of the gap by providing for controllable relative movement between the surfaces defining the gap.