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1. (WO2013159646) COVER PLATE AND METHOD FOR MANUFACTURING THE SAME, SOLAR GLASS, AND PHOTOVOLTAIC DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/159646    International Application No.:    PCT/CN2013/073994
Publication Date: 31.10.2013 International Filing Date: 10.04.2013
IPC:
H01L 31/0216 (2014.01), H01L 31/18 (2006.01)
Applicants: SAINT-GOBAIN GLASS FRANCE [FR/FR]; 18 Avenue d'Alsace F-92400 Courbevoie (FR) (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IS, IT, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, ZA, ZM, ZW only).
LUO, Linda [CN/CN]; (CN) (US only).
DING, Holly [CN/CN]; (CN) (US only).
SCHWEITZER, Jean-Philippe [FR/CN]; (CN) (US only).
PARK, Seunghwan [KR/CN]; (CN) (US only)
Inventors: LUO, Linda; (CN).
DING, Holly; (CN).
SCHWEITZER, Jean-Philippe; (CN).
PARK, Seunghwan; (CN)
Agent: UNITALEN ATTORNEYS AT LAW; 7th Floor, Scitech Place No.22, Jian Guo Men Wai Ave., Chao Yang District Beijing 100004 (CN)
Priority Data:
201210135182. 4 28.04.2012 CN
Title (EN) COVER PLATE AND METHOD FOR MANUFACTURING THE SAME, SOLAR GLASS, AND PHOTOVOLTAIC DEVICE
(FR) PLAQUE DE COUVERCLE ET SON PROCÉDÉ DE FABRICATION, VERRE SOLAIRE, ET DISPOSITIF PHOTOVOLTAÏQUE
Abstract: front page image
(EN)A cover plate and a method for manufacturing the same, a solar glass, and a photovoltaic device are provided. The cover plate (500) is adapted for covering a work device which, in operation, causes an electric field in the cover plate. The cover plate (500) comprises: a transparent substrate (530), having a first surface and a second surface opposite to the first surface, the first surface being adjacent to the work device; and a barrier structure, having at least one of a first barrier layer (510) on the first surface and a second barrier layer (520) on the second surface, configured to prevent performance degradation of the work device caused by leakage current and/or metal ions migration.
(FR)L'invention concerne une plaque de couvercle et son procédé de fabrication, un verre solaire, et un dispositif photovoltaïque. La plaque de couvercle (500) permet de couvrir un dispositif de travail qui, en fonctionnement, produit un champ électrique dans la plaque de couvercle. La plaque de couvercle (500) comprend : un substrat transparent (530) ayant une première surface et une seconde surface opposée à la première surface, la première surface étant adjacente au dispositif de travail ; et une structure de barrière, ayant au moins l'un des éléments parmi une première couche de barrière (510) sur la première surface et une seconde couche de barrière (520) sur la seconde surface, configurée(s) pour prévenir la dégradation de performance du dispositif de travail causée par le courant de fuite et/ou la migration d'ions de métal.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)