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1. (WO2013158593) CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRA-VIOLET RETICLES

Pub. No.:    WO/2013/158593    International Application No.:    PCT/US2013/036702
Publication Date: Fri Oct 25 01:59:59 CEST 2013 International Filing Date: Wed Apr 17 01:59:59 CEST 2013
IPC: G01B 11/24
H01L 21/66
H01L 21/027
G01N 21/88
Applicants: KLA-TENCOR CORPORATION
Inventors: SHI, Rui-fang
POKROVSKIY, Alex
SEZGINER, Abdurrahman
SOUSA, Weston L.
Title: CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRA-VIOLET RETICLES
Abstract:
Disclosed are methods and apparatus for facilitating an inspection of a sample using an optical inspection tool. An optical inspection tool is used to obtain an optical image or signal from an EUV reticle that specifies an intensity variation across the EUV reticle, and this intensity variation is converted to a CD variation that removes a flare correction CD variation so as to generate a critical dimension uniformity (CDU) map without the flare correction CD variation. This removed flare correction CD variation originates from design data for fabricating the EUV reticle, and such flare correction CD variation is generally designed to compensate for flare differences that are present across a field of view (FOV) of a photolithography tool during a photolithography process. The CDU map is stored in one or more memory devices and/or displayed on a display device, for example, of the inspection tool or a photolithography system.