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1. (WO2013157356) MASK UNIT AND SUBSTRATE PROCESSING DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/157356 International Application No.: PCT/JP2013/058686
Publication Date: 24.10.2013 International Filing Date: 26.03.2013
IPC:
G03F 7/24 (2006.01) ,G03F 7/20 (2006.01) ,H01L 21/027 (2006.01) ,H01L 21/683 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
24
Curved surfaces
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 東京都千代田区有楽町一丁目12番1号 12-1, Yurakucho 1-chome, Chiyoda-ku, Tokyo 1008331, JP
Inventors:
鈴木 智也 SUZUKI Tomonari; JP
Agent:
志賀 正武 SHIGA Masatake; 東京都千代田区丸の内一丁目9番2号 1-9-2, Marunouchi, Chiyoda-ku, Tokyo 1006620, JP
Priority Data:
2012-09589419.04.2012JP
Title (EN) MASK UNIT AND SUBSTRATE PROCESSING DEVICE
(FR) UNITÉ DE MASQUE ET DISPOSITIF DE TRAITEMENT DE SUBSTRAT
(JA) マスクユニット及び基板処理装置
Abstract:
(EN) A mask unit comprises: a mask holding unit (20) which holds a mask pattern on a cylindrical surface with a prescribed radius centered on a first axial line (AX1) and is rotatable around the first axial line; a support unit (22) for supporting the mask holding unit in a contactless or low friction state so that the mask holding unit is able to rotate around and move in the direction of the first axial line; and a pair of driving units (MT) which is provided on both sides in the first axial line direction of the mask holding unit and drives the mask holding unit by propelling the mask holding unit to rotate around the first axial line.
(FR) La présente invention porte sur une unité de masque qui comprend : une unité de maintien de masque (20) qui maintient un motif de masque sur une surface cylindrique ayant un rayon prescrit centré sur une première ligne axiale (AX1) et est apte à tourner autour de la première ligne axiale ; une unité de support (22) pour supporter l'unité de maintien de masque dans un état sans contact ou de frottement faible de telle sorte que l'unité de maintien de masque est apte à tourner autour et à se déplacer dans la direction de la première ligne axiale ; et une paire d'unités d'entraînement (MT) qui est disposée sur les deux côtés dans la direction de première ligne axiale de l'unité de maintien de masque et entraîne l'unité de maintien de masque en poussant l'unité de maintien de masque à tourner autour de la première ligne axiale.
(JA)  マスクユニットは、第1の軸線(AX1)から所定半径の円筒面に沿ってマスクパターンを保持し、第1の軸線周りに回転可能なマスク保持部(20)と、マスク保持部を第1の軸線周り方向及び第1の軸線方向に、非接触状態若しくは低摩擦状態で移動自在に支持する支持部(22)と、マスク保持部の第1の軸線方向の両側に設けられ、マスク保持部に第1の軸線周り方向の推力を与えて駆動させる一対の駆動部(MT)と、を備える。
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)