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1. (WO2013156597) HIGH PERFORMANCE POSITIVELY CHARGED COMPOSITE MEMBRANES AND THEIR USE IN NANOFILTRATION PROCESSES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/156597    International Application No.:    PCT/EP2013/058170
Publication Date: 24.10.2013 International Filing Date: 19.04.2013
Chapter 2 Demand Filed:    20.02.2014    
IPC:
B01D 69/12 (2006.01), B01D 71/68 (2006.01), B01D 71/78 (2006.01), B01D 71/80 (2006.01), B01D 69/10 (2006.01), B01D 61/02 (2006.01)
Applicants: BASF SE [DE/DE]; 67056 Ludwigshafen (DE).
NATIONAL UNIVERSITY OF SINGAPORE [SG/SG]; 21 Lower Kent Ridge Road Singapore 119077 (SG)
Inventors: WEBER, Martin; (DE).
MALETZKO, Christian; (DE).
TROTTE, Bernd; (DE).
ZHONG, Peishan; (SG).
CHUNG, Tai-Shung; (US)
Agent: REITSTÖTTER KINZEBACH; Sternwartstraße 4 81679 München (DE)
Priority Data:
12165055.0 20.04.2012 EP
Title (EN) HIGH PERFORMANCE POSITIVELY CHARGED COMPOSITE MEMBRANES AND THEIR USE IN NANOFILTRATION PROCESSES
(FR) MEMBRANES COMPOSITES CHARGÉES POSITIVEMENT À PERFORMANCE ÉLEVÉE ET LEUR UTILISATION DANS DES PROCÉDÉS DE NANOFILTRATION
Abstract: front page image
(EN)The present invention is directed to positively charged nanofiltration (NF) membranes comprising a substrate layer (S) based on a sulfonated polymer and a positively charged film layer (F) on top of said substrate, and to a method for their preparation. Furthermore, the present invention is directed to nanofiltration processes making use of said composite membrane.
(FR)La présente invention concerne des membranes de nanofiltration (NF) chargées positivement comprenant une couche de substrat (S) basée sur un polymère sulfoné et une couche de film chargée positivement (F) sur le dessus dudit substrat, et un procédé pour leur préparation. De plus, la présente invention concerne des procédés de nanofiltration utilisant ladite membrane composite.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)