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1. (WO2013154297) HEATER-ELEVATABLE SUBSTRATE PROCESSING APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/154297    International Application No.:    PCT/KR2013/002773
Publication Date: 17.10.2013 International Filing Date: 03.04.2013
IPC:
H01L 21/20 (2006.01)
Applicants: EUGENE TECHNOLOGY CO., LTD. [KR/KR]; 42 Chugye-ro, Yangji-myeon Cheoin-gu, Yongin-si Gyeonggi-do 449-824 (KR)
Inventors: YANG, Il-Kwang; (KR).
SONG, Byoung-Gyu; (KR).
KIM, Kyong-Hun; (KR).
KIM, Yong-Ki; (KR).
SHIN, Yang-Sik; (KR)
Agent: JEONG, Seong-Jin; (2nd Floor, ACE HIGH-END TOWER 3, Gasan-Dong) Rm. 204, 145 Gasan Digital 1-ro, Gumchun-gu Seoul 153-787 (KR)
Priority Data:
10-2012-0037299 10.04.2012 KR
Title (EN) HEATER-ELEVATABLE SUBSTRATE PROCESSING APPARATUS
(FR) APPAREIL DE TRAITEMENT DE SUBSTRAT À ÉLÉMENT CHAUFFANT ASCENDANT/DESCENDANT
(KO) 히터 승강형 기판 처리 장치
Abstract: front page image
(EN)According to an embodiment of the present invention, a substrate processing apparatus comprises: a chamber that provides an inner space where processing is performed on a substrate; a heating plate that is fixed into the chamber, the substrate being placed in an upper portion thereof; a heater that is disposed at a distance in a lower portion of the heating plate to heat the heating plate; and an elevating module that elevates the heater.
(FR)Selon un mode de réalisation, cette invention concerne un appareil de traitement de substrat, comprenant : une chambre qui définit un espace intérieur dans lequel un traitement est réalisé sur un substrat ; une plaque chauffante fixée dans la chambre, le substrat étant disposé sur une partie supérieure de celle-ci ; un élément chauffant disposé à distance en dessous de la plaque chauffante pour chauffer la plaque chauffante ; et un module élévateur qui relève l'élément chauffant.
(KO)본 발명의 일 실시예에 의하면, 기판 처리 장치는, 기판에 대한 공정이 이루어지는 내부공간을 제공하는 챔버; 상기 챔버의 내부에 고정 설치되며, 상부에 상기 기판이 놓쳐지는 히팅 플레이트; 상기 히팅 플레이트의 하부에 이격 설치되며, 상기 히팅 플레이트를 가열하는 히터; 및 상기 히터를 승강하는 승강 모듈을 포함한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)