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1. (WO2013154253) ELECTRODE INCLUDING POROUS COATING LAYER, METHOD FOR MANUFACTURING SAME, AND ELECTROCHEMICAL DEVICE INCLUDING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/154253    International Application No.:    PCT/KR2012/011377
Publication Date: 17.10.2013 International Filing Date: 24.12.2012
IPC:
H01M 4/13 (2010.01), H01M 4/66 (2006.01), H01M 4/36 (2006.01), H01M 4/139 (2010.01)
Applicants: LG CHEM, LTD. [KR/KR]; 128, Yeoui-daero, Youngdungpo-gu Seoul 150-721 (KR)
Inventors: LEE, Joo-Sung; (KR).
KIM, Jong-Hun; (KR).
HA, Jeong-Min; (KR).
JIN, Sun-Mi; (KR).
RYU, Bo-Kyung; (KR).
KIM, Jin-Woo; (KR)
Agent: PHIL & ONZI INT'L PATENT & LAW FIRM; 8F., 63, Banpo-daero, Seocho-gu Seoul 137-872 (KR)
Priority Data:
10-2012-0037356 10.04.2012 KR
Title (EN) ELECTRODE INCLUDING POROUS COATING LAYER, METHOD FOR MANUFACTURING SAME, AND ELECTROCHEMICAL DEVICE INCLUDING SAME
(FR) ELECTRODE COMPRENANT UNE COUCHE DE REVÊTEMENT POREUX, PROCÉDÉ DE FABRICATION DE CELLE-CI, ET DISPOSITIF ÉLECTROCHIMIQUE LA COMPRENANT
(KO) 다공성 코팅층을 포함하는 전극, 상기 전극의 제조방법 및 상기 전극을 포함하는 전기화학소자
Abstract: front page image
(EN)The present invention relates to an electrode provided with a porous coating layer having a thickness deviation represented by formula 1 below, and to a method for manufacturing same, wherein the electrode comprises: a collector; an electrode active material layer formed on at least one surface of the collector, and including a composition consisting of electrode active material particles and a first binder polymer; and a composition consisting of inorganic particles and a second binder polymer, which is formed on the surface of the electrode active material layer. [Formula 1]: (Tmax-Tmin)/Tavg ≤ 0.35. In formula 1, when sections of the porous coating layer are observed using an electron microscope, Tmax is the maximum thickness of the porous coating layer formed on the surface of the electrode active material layer, Tmin is the minimum thickness of the porous coating layer, and Tavg is the average thickness of the coating layer. The present invention enables the manufacture of an electrode using a method for simultaneously drying the electrode active material layer and the porous coating layer, and prevents the binder polymer of the porous coating layer from infiltrating the electrode active material layer so as to impart excellent quality to the electrode. Further, the uniform formation of the porous coating layer contributes to the stability of a battery.
(FR)La présente invention concerne une électrode comprenant une couche de revêtement poreux ayant une variation d'épaisseur représentée par la formule 1 ci-dessous, et un procédé de fabrication de celle-ci, l'électrode comprenant : un collecteur ; une couche de matériau actif d'électrode formée sur au moins une surface du collecteur, et comprenant une composition consistant en des particules de matériau actif d'électrode et un premier polymère liant ; et une composition consistant en des particules inorganiques et un second polymère liant, qui est formée sur la surface de la couche de matériau actif d'électrode. [Formule 1] : (Tmax-Tmin)/Tavg ≤ 0,35. Dans la formule 1, lorsque les sections de la couche de revêtement poreux sont observées en utilisant un microscope électronique, Tmax est l'épaisseur maximale de la couche de revêtement poreux formée sur la surface de la couche de matériau actif d'électrode, Tmin est l'épaisseur minimale de la couche de revêtement poreux, et Tavg est l'épaisseur moyenne de la couche de revêtement. La présente invention permet la fabrication d'une électrode en utilisant un procédé de séchage simultané de la couche de matériau actif d'électrode et de la couche de revêtement poreux, et évite que le polymère liant de la couche de revêtement poreux ne s'infiltre dans la couche de matériau actif d'électrode, de façon à fournir une excellente qualité à l'électrode. En outre, la formation uniforme de la couche de revêtement poreux contribue à la stabilité d'une batterie.
(KO)본 발명은 집전체; 상기 집전체의 적어도 일면에 형성되며, 전극활물질 입자와 제1 바인더 고분자의 혼합물을 포함하는 전극활물질층; 및 상기 전극활물질층의 표면에 형성되며, 무기물 입자와 제2 바인더 고분자의 혼합물을 포함하고, 하기 수학식 1의 두께 편차를 갖는 다공성 코팅층을 구비하는 전극 및 이의 제조방법에 대한 것이다: [수학식 1] (Tmax-Tmin)/Tavg ≤ 0.35 상기 수학식 1에서, Tmax는 다공성 코팅층 단면을 전자현미경으로 관찰하였을 때 전극활물질층 표면에 형성된 다공성 코팅층의 최대 두께이고, Tmin은 다공성 코팅층의 최소 두께이고, Tavg는 다공성 코팅층의 평균 두께이다. 본 발명은 전극활물질층과 다공성 코팅층을 동시에 건조시키는 방법으로 전극을 제조하므로 다공성 코팅층의 바인더 고분자가 전극활물질층으로 침투하는 것을 방지하여 전극의 품질이 우수하며, 또한 다공성 코팅층이 균일하게 형성되므로 전지의 안정성에 기여할 수 있다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)