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|1. (WO2013152877) ROTATABLE FRAME FOR A LITHOGRAPHIC APPARATUS|
|Applicants:||ASML NETHERLANDS B.V.
DE JAGER, Pieter
CADEE, Theodorus Petrus Maria
|Title:||ROTATABLE FRAME FOR A LITHOGRAPHIC APPARATUS|
A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.