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1. (WO2013152877) ROTATABLE FRAME FOR A LITHOGRAPHIC APPARATUS

Pub. No.:    WO/2013/152877    International Application No.:    PCT/EP2013/051800
Publication Date: Fri Oct 18 01:59:59 CEST 2013 International Filing Date: Thu Jan 31 00:59:59 CET 2013
IPC: G03F 7/20
Applicants: ASML NETHERLANDS B.V.
Inventors: BLEEKER, Arno
CASTENMILLER, Thomas
DE JAGER, Pieter
MULDER, Heine
ZAAL, Koen
CADEE, Theodorus Petrus Maria
PHILIPS, Danny
BEERENS, Ruud
TIMMERMANS, Roger
Title: ROTATABLE FRAME FOR A LITHOGRAPHIC APPARATUS
Abstract:
A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.