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1. (WO2013148126) THREE-DIMENSIONAL PHOTORESISTS VIA FUNCTIONALIZATION OF POLYMER THIN FILMS FABRICATED BY ICVD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/148126 International Application No.: PCT/US2013/030127
Publication Date: 03.10.2013 International Filing Date: 11.03.2013
IPC:
C23C 16/48 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
48
by irradiation, e.g. photolysis, radiolysis, particle radiation
Applicants: MASSACHUSETTS INSTITUTE OF TECHNOLOGY[US/US]; 77 Massachusetts Avenue Cambridge, MA 02139, US
Inventors: GLEASON, Karen, K.; US
PETRUCZOK, Christy, D.; US
Agent: GORDON, Dana M.; Foley Hoag LLP Patent Group 155 Seaport Blvd. Boston, MA 02210-2600, US
Priority Data:
61/616,13927.03.2012US
Title (EN) THREE-DIMENSIONAL PHOTORESISTS VIA FUNCTIONALIZATION OF POLYMER THIN FILMS FABRICATED BY ICVD
(FR) PHOTORÉSERVES TRIDIMENSIONNELLES OBTENUES PAR FONCTIONNALISATION DE COUCHES MINCES POLYMÈRES FABRIQUÉES PAR ICVD
Abstract:
(EN) Disclosed are simple, efficient, and scalable methods of patterning polymeric or metallic microstructures on planar or non-planar surfaces. The methods utilize initiated chemical vapor deposition (iCVD) technology. Also disclosed are patterned articles produced by these methods, and methods of using the articles.
(FR) La présente invention concerne des procédés simples, efficaces et évolutifs de dessin de microstructures polymères ou métalliques sur des surfaces planes ou non planes. Les procédés utilisent une technique de dépôt chimique en phase vapeur initié (iCVD). La présente invention concerne également des articles structurés produits selon ces procédés et des procédés d'utilisation des articles.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)