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1. (WO2013146733) POLISHING PAD AND METHOD FOR PRODUCING POLISHING PAD

Pub. No.:    WO/2013/146733    International Application No.:    PCT/JP2013/058690
Publication Date: Fri Oct 04 01:59:59 CEST 2013 International Filing Date: Wed Mar 27 00:59:59 CET 2013
IPC: C08J 5/14
B24B 37/24
H01L 21/304
Applicants: FUJIBO HOLDINGS, INC.
富士紡ホールディングス株式会社
Inventors: TATENO Teppei
立野 哲平
MIYASAKA Hirohito
宮坂 博仁
MATSUOKA Ryuma
松岡 立馬
KANAZAWA Yoshie
金澤 香枝
MIYAZAWA Fumio
宮澤 文雄
Title: POLISHING PAD AND METHOD FOR PRODUCING POLISHING PAD
Abstract:
A method for producing a polishing pad having a polyurethane resin film as a polishing layer on a film substrate, the method comprising: a step in which a polyurethane resin film-forming composition containing a polyurethane resin and an additive is dissolved in a solvent in which the resin can be dissolved; a step for removing an insoluble component in the solution so that the insoluble component reaches less than 1 mass% in relation to the total mass of the polyurethane resin film-forming composition; a step for adding and mixing a poor solvent into the solution from which the insoluble component has been removed, in an amount (in mL) calculated by the formula (1): "Coagulation value of the polyurethane resin in the poor solvent (in mL) × A" (where A = 0.007 to 0.027) per gram by mass of the solid content of the resin; and a step for forming a film of the mixed solution on a film-forming substrate by wet coagulation to produce the polyurethane resin film. Provided thereby are a method for producing a finishing polishing pad and a polishing pad which enable polishing with fewer polishing defects and make it possible to form a stable film.