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1. WO2013146677 - SWASH PLATE

Publication Number WO/2013/146677
Publication Date 03.10.2013
International Application No. PCT/JP2013/058567
International Filing Date 25.03.2013
Chapter 2 Demand Filed 23.01.2014
IPC
F04B 27/08 2006.01
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
27Multi-cylinder pumps specially adapted for elastic fluids and characterised by number or arrangement of cylinders
08having cylinders coaxial with, or parallel or inclined to, main shaft axis
CPC
F04B 27/08
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
27Multi-cylinder pumps specially adapted for elastic fluids and characterised by number or arrangement of cylinders
08having cylinders coaxial with, or parallel or inclined to, main shaft axis
F04B 27/086
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
27Multi-cylinder pumps specially adapted for elastic fluids and characterised by number or arrangement of cylinders
08having cylinders coaxial with, or parallel or inclined to, main shaft axis
0804having rotary cylinder block
0821component parts, details, e.g. valves, sealings, lubrication
086swash plate
F04B 27/0873
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
27Multi-cylinder pumps specially adapted for elastic fluids and characterised by number or arrangement of cylinders
08having cylinders coaxial with, or parallel or inclined to, main shaft axis
0873Component parts, e.g. sealings; Manufacturing or assembly thereof
F04B 27/0886
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
27Multi-cylinder pumps specially adapted for elastic fluids and characterised by number or arrangement of cylinders
08having cylinders coaxial with, or parallel or inclined to, main shaft axis
0873Component parts, e.g. sealings; Manufacturing or assembly thereof
0878Pistons
0886Piston shoes
F04B 27/0891
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
27Multi-cylinder pumps specially adapted for elastic fluids and characterised by number or arrangement of cylinders
08having cylinders coaxial with, or parallel or inclined to, main shaft axis
0873Component parts, e.g. sealings; Manufacturing or assembly thereof
0891casings, housings
F05C 2251/14
FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
05INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
CINDEXING SCHEME RELATING TO MATERIALS, MATERIAL PROPERTIES OR MATERIAL CHARACTERISTICS FOR MACHINES, ENGINES OR PUMPS OTHER THAN NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES
2251Material properties
14Self lubricating materials; Solid lubricants
Applicants
  • 大豊工業株式会社 TAIHO KOGYO CO., LTD. [JP]/[JP]
Inventors
  • 柴田 正人 SHIBATA Masato
  • 山根 恭平 YAMANE Kyohei
  • 後藤 真吾 GOTO Shingo
Agents
  • 矢野 寿一郎 YANO Juichiro
Priority Data
2012-06961026.03.2012JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) SWASH PLATE
(FR) PLATEAU OSCILLANT
(JA) 斜板
Abstract
(EN)
The outer periphery of the end surface (11B) of a substrate (11) is a chamfer (11C), and the end surface (11B) of the substrate (11) is covered by a resin film layer (12). The thickness of the resin film layer (12) at the chamfer (11C) is thicker than the locations radially further inwards from said chamfer. The surface of the resin film layer (12) on the outer peripheral edge (11B') of the end surface (11B) is coplanar with the surface of the resin film layer (12) further inwards. These locations act as the sliding surface (the surface (2A) of the swash plate (2)) that slides on a shoe (4), and compared with conventional techniques, because the resin film layer (12) in the outer peripheral edge (11B') is thick, attrition of the portion being pressed against the shoe (4) is suppressed. For that reason, the outer peripheral edge (11B') of the substrate (11) and the vicinity thereof are prevented from being exposed, and seizure of the swash plate (2) can be prevented.
(FR)
Selon la présente invention, la périphérie externe de la surface d'extrémité (11B) d'un substrat (11) est un chanfrein (11C), et la surface d'extrémité (11B) du substrat (11) est recouverte d'une couche (12) de film de résine. L'épaisseur de la couche (12) de film de résine au niveau du chanfrein (11C) est plus grande que les emplacements situés plus vers l'intérieur de façon radiale à partir dudit chanfrein. La surface de la couche (12) de film de résine sur le bord périphérique externe (11B') de la surface d'extrémité (11B) est coplanaire avec la surface de la couche (12) de film de résine située plus vers l'intérieur. Ces emplacements agissent comme la surface coulissante (la surface [2A] du plateau oscillant [2]) qui coulisse sur un patin (4), et comparativement avec les techniques classiques, du fait que la couche (12) de film de résine dans le bord périphérique externe (11B') est épaisse, l'attrition de la partie appuyée contre le patin (4) est supprimée. C'est la raison pour laquelle le bord périphérique externe (11B') du substrat (11) et son voisinage ne peuvent pas être exposés, et le grippage du plateau oscillant (2) peut être évité.
(JA)
 基材11の端面11Bの外周部は面取り部11Cとなっており、基材11の端面11Bは樹脂被膜層12により被覆されている。上記面取り部11Cにおける樹脂被膜層12の厚さは、そこよりも半径方向内方側の箇所よりも厚肉となっている。端面11Bの外周縁11B'における樹脂被膜層12の表面と、そこよりも内方側の樹脂被膜層12の表面とが同一平面となり、それらの箇所がシュー4と摺動する摺動面(斜板2の表面2A)となり、従来と比較すると、上記外周縁11B'における樹脂被膜層12が厚肉となっているので、その部分がシュー4に押圧されて摩滅するのを抑制することができる。そのため、基材11の外周縁11B'とその近傍が露出するのを防止して、斜板2の焼付きを防止できる。
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